2-Ethoxyethanol

2-Ethoxyethanol

SCHEMBL8613682

CCNCC.CCOCCO

nearest known ligand 0.74

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CCKAR

The experimentally established mechanism targets of 2-Ethoxyethanol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.74
TSHR P16473 3/20 0.45
MAPK1 P28482 1/20 0.45
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
TP53 P04637 1/20 0.42
THRB P10828 2/20 0.39
HTT P42858 1/20 0.39
MAPT P10636 1/20 0.39
KDM4E B2RXH2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Di(Hydroxyethyl)Ether SCHEMBL7553011 0.89 TSHR (0.59) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL4686 0.86
2-Ethoxyethanol SCHEMBL11024472 0.86 ALDH1A1 (1.00) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL9547497 0.86 ALDH1A1 (1.00) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL9432157 0.86 ALDH1A1 (1.00) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL110078 0.83
2-Ethoxyethanol SCHEMBL8056895 0.83 ALDH1A1 (0.93) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL10491734 0.83 ALDH1A1 (0.93) ALDH1A1TSHRMAPK1MEN1KMT2A
2-Ethoxyethanol SCHEMBL489358 0.83
2-Ethoxyethanol SCHEMBL337831 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0518352-B1 Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK & CHEMICALS (JP) 1998-04-22 EP disclosed
US-5460919-A Process of forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK AND CHEMICALS, INC. (JP) 1995-10-24 US disclosed
US-5372911-A Support having one or more hydrophilic colloidal layers, at least one layer contains pyridinium salt or derivative, quinolinium salt or derivative, or isoquinolinium salt or derivative DAINIPPON INK AND CHEMICALS, INC. (JP) 1994-12-13 US disclosed
EP-0518352-A1 Process for forming super high-contrast negative images and silver halide photographic material and developer being used therefor DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-12-16 EP disclosed