SCHEMBL8629316

SCHEMBL8629316

Nc1ccc(C(=O)Oc2ccc(O)cc2)c(N)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.58
CYP3A4 P08684 3/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
LMNA P02545 2/20 0.58
TP53 P04637 1/20 0.58
ADORA3 P0DMS8 1/20 0.58
CHRM1 P11229 1/20 0.58
TBXA2R P21731 1/20 0.58
SLC6A2 P23975 1/20 0.58
PDE4A P27815 1/20 0.58
ADRA1A P35348 1/20 0.58
KDR P35968 1/20 0.58
SLC6A3 Q01959 1/20 0.58
HDAC6 Q9UBN7 1/20 0.58
ALDH1A1 P00352 5/20 0.55
KMT2A Q03164 4/20 0.55
KDM4E B2RXH2 5/20 0.47
GAA P10253 4/20 0.47
GLA P06280 3/20 0.47
THRB P10828 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8631487 0.83 CYP3A4 (0.57) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL16356158 0.81 MAPT (0.49) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL12774697 0.77 ALDH1A1 (0.46) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL11198285 0.77 MAPT (0.51) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL30660134 0.76 MAPT (0.48) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL13124083 0.76 NPC1 (0.54) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL12774698 0.76 NPC1 (0.54) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL13124084 0.76 NPC1 (0.54) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL8629544 0.75 MAPT (0.56) MAPTCYP3A4SMN1; SMN2LMNATP53
SCHEMBL9010718 0.75 CA12 (0.61) MAPTCYP3A4SMN1; SMN2LMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130237040-A1 RESIN COMPOSITION, LAMINATE AND PROCESS FOR PRODUCTION THEREOF, STRUCTURE AND PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF ELECTRONIC DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2013-09-12 US disclosed
US-5747625-A Silicate group-containing polyimide NIPPON STEEL CHEMICAL CO., LTD. (JP) 1998-05-05 US disclosed