SCHEMBL8629544

SCHEMBL8629544

Nc1ccc(C(=O)Oc2ccccc2O)c(N)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.56
CYP3A4 P08684 3/20 0.56
SMN1; SMN2 Q16637 3/20 0.56
KDR P35968 2/20 0.56
LMNA P02545 1/20 0.56
TP53 P04637 1/20 0.56
ADORA3 P0DMS8 1/20 0.56
CHRM1 P11229 1/20 0.56
TBXA2R P21731 1/20 0.56
SLC6A2 P23975 1/20 0.56
PDE4A P27815 1/20 0.56
ADRA1A P35348 1/20 0.56
SLC6A3 Q01959 1/20 0.56
HDAC6 Q9UBN7 1/20 0.56
GAA P10253 5/20 0.53
KMT2A Q03164 5/20 0.53
POLB P06746 2/20 0.53
ALDH1A1 P00352 5/20 0.49
KDM4E B2RXH2 5/20 0.49
HSD17B10 Q99714 5/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8632649 0.89 MAPT (0.50) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL14577689 0.77 MAPT (0.64) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL2352963 0.77 KDM4E (0.69) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL3635482 0.77 HPGD (0.76) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL8625983 0.77 SERPINE1 (0.59) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL10786803 0.77 SERPINE1 (0.59) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL1982348 0.76 CYP3A4 (0.51) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL10786871 0.76 KMT2A (0.68) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL28632573 0.76 MAPT (0.62) MAPTCYP3A4SMN1; SMN2KDRLMNA
SCHEMBL8629316 0.75 MAPT (0.58) MAPTCYP3A4SMN1; SMN2KDRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130237040-A1 RESIN COMPOSITION, LAMINATE AND PROCESS FOR PRODUCTION THEREOF, STRUCTURE AND PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF ELECTRONIC DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2013-09-12 US disclosed
US-5747625-A Silicate group-containing polyimide NIPPON STEEL CHEMICAL CO., LTD. (JP) 1998-05-05 US disclosed