Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.50 |
| ▸ | CA1 | P00915 | 3/20 | 0.50 |
| ▸ | CA2 | P00918 | 3/20 | 0.50 |
| ▸ | CA7 | P43166 | 3/20 | 0.50 |
| ▸ | CA9 | Q16790 | 3/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 1/20 | 0.50 |
| ▸ | CA6 | P23280 | 1/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.50 |
| ▸ | PLAA | Q9Y263 | 3/20 | 0.49 |
| ▸ | ALPG | P10696 | 6/20 | 0.47 |
| ▸ | ALPL | P05186 | 2/20 | 0.46 |
| ▸ | XDH | P47989 | 2/20 | 0.46 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.46 |
| ▸ | SNCA | P37840 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28023536 | 0.82 | KLKB1 (0.47) | CA12CA1CA2CA7CA9 | |
| SCHEMBL20897645 | 0.81 | SLC22A6 (0.62) | KDM4EGAAPOLBHDAC6MEN1 | |
| SCHEMBL9246992 | 0.80 | KDM4E (0.46) | CA12CA1CA2CA7CA9 | |
| SCHEMBL10648900 | 0.79 | POLB (0.36) | CA12CA1CA2CA7CA9 | |
| SCHEMBL2221664 | 0.78 | ALDH5A1 (0.59) | CA12CA1CA2CA7CA9 | |
| SCHEMBL1806027 | 0.78 | ALDH5A1 (0.59) | CA12CA1CA2CA7CA9 | |
| SCHEMBL9768042 | 0.78 | ALPG (0.46) | CA12CA1CA2CA7CA9 | |
| SCHEMBL17052402 | 0.77 | KDM4E (0.39) | KDM4EMAPTPOLBTDP1MEN1 | |
| SCHEMBL11209301 | 0.77 | CA12 (0.53) | CA12CA1CA2CA9KDM4E | |
| Hydrochloric Acid SCHEMBL15861834 | 0.76 | ALDH5A1 (0.57) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0692733-B1 | Direct thermal recording process | AGFA GEVAERT NV (BE) | 1998-02-04 | — | — | EP | claimed |
| CN-100346776-C | Remedies | TAKARA BIO INC (JP) | 2007-11-07 | — | — | CN | disclosed |
| CN-1419448-A | Remedies | TAKARA BIO INC (JP) | 2003-05-21 | — | — | CN | disclosed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0508269-B1 | Radiation-sensitive ester and process for its production | HOECHST AG (DE) | 1995-02-01 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-5300396-A | Process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1994-04-05 | — | — | US | disclosed |
| US-5268252-A | Polyol with o-naphthoquinone-2-diazide-4-sulfonic acid | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-12-07 | — | — | US | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| EP-0244763-B1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM | HOECHST CELANESE CORPORATION (US) | 1993-03-10 | — | — | EP | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |