Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | FUT7 | Q11130 | 2/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | CA3 | P07451 | 1/20 | 0.46 |
| ▸ | SELL | P14151 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | SELP | P16109 | 1/20 | 0.46 |
| ▸ | FUT4 | P22083 | 1/20 | 0.46 |
| ▸ | CA4 | P22748 | 1/20 | 0.46 |
| ▸ | CA6 | P23280 | 1/20 | 0.46 |
| ▸ | DPP4 | P27487 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9246954 | 0.83 | CA12 (0.46) | CA12CA1CA2CA5ASNCA | |
| SCHEMBL8630005 | 0.80 | CA12 (0.50) | KDM4ETDP1MAPTCA12CA1 | |
| SCHEMBL31574338 | 0.77 | CA12 (0.44) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL25760150 | 0.76 | GABRA1 (0.47) | LMNAALDH1A1CA1CA2GAA | |
| SCHEMBL25760105 | 0.76 | ALOX5 (0.51) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL19913002 | 0.73 | HPGD (0.41) | KDM4ELMNATDP1ALDH1A1TP53 | |
| SCHEMBL10498467 | 0.73 | KDM4E (0.54) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL1806027 | 0.72 | ALDH5A1 (0.59) | KDM4ELMNATDP1ALDH1A1MAPT | |
| Gallic Acid SCHEMBL29503723 | 0.72 | CA12 (0.74) | KDM4ELMNATDP1ALDH1A1MAPT | |
| Gallic Acid SCHEMBL28021798 | 0.72 | CA12 (0.74) | KDM4ELMNATDP1ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0508269-B1 | Radiation-sensitive ester and process for its production | HOECHST AG (DE) | 1995-02-01 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-5300396-A | Process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1994-04-05 | — | — | US | disclosed |
| US-5268252-A | Polyol with o-naphthoquinone-2-diazide-4-sulfonic acid | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-12-07 | — | — | US | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| EP-0244763-B1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM | HOECHST CELANESE CORPORATION (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5162510-A | Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide | HOECHST CELANESE CORPORATION (US) | 1992-11-10 | — | — | US | disclosed |
| EP-0508269-A1 | Radiation-sensitive ester and process for its production | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-14 | — | — | EP | disclosed |
| EP-0488686-A1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1992-06-03 | — | — | EP | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |