⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3322983 | 0.83 | — | — | |
| Hydrogen Sulfide SCHEMBL27812838 | 0.80 | — | — | |
| SCHEMBL2114831 | 0.75 | — | — | |
| SCHEMBL930258 | 0.75 | — | — | |
| Water SCHEMBL1278110 | 0.74 | — | — | |
| Water SCHEMBL640273 | 0.74 | — | — | |
| Propionitrile SCHEMBL21194962 | 0.72 | ALDH1A1 (0.53) | — | |
| Butane SCHEMBL3380761 | 0.72 | — | — | |
| Chloromethane SCHEMBL29158744 | 0.71 | — | — | |
| Water SCHEMBL28296795 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115401758-A | Impregnation liquid for outdoor heavy bamboo products and processing technology thereof | 江西米来竹业有限公司 | 2022-11-29 | — | — | CN | claimed |
| CN-118160115-A | Method for preparing positive electrode binder or positive electrode insulating solution for lithium secondary battery and lithium secondary battery comprising positive electrode binder or positive electrode insulating solution prepared thereby | 株式会社LG化学 | 2024-06-07 | — | — | CN | disclosed |
| CN-118077083-A | Insulating layer forming composition for lithium secondary battery and lithium secondary battery comprising the same | 株式会社LG化学 | 2024-05-24 | — | — | CN | disclosed |
| CN-118077084-A | Insulating layer composition for lithium secondary battery and lithium secondary battery comprising the same | 株式会社LG化学 | 2024-05-24 | — | — | CN | disclosed |
| CN-115401758-A | Impregnation liquid for outdoor heavy bamboo products and processing technology thereof | 江西米来竹业有限公司 | 2022-11-29 | — | — | CN | disclosed |
| US-10101655-B2 | Compound, polymer, photosensitive resin composition, and color filter | SAMSUNG SDI CO., LTD. (KR) | 2018-10-16 | — | — | US | disclosed |
| US-10087170-B2 | Compound, photosensitive resin composition including the same, and color filter | SAMSUNG SDI CO., LTD. (KR) | 2018-10-02 | — | — | US | disclosed |
| US-10042087-B2 | Photosensitive resin composition and color filter using the same | SAMSUNG SDI CO., LTD. (KR) | 2018-08-07 | — | — | US | disclosed |
| US-10031417-B2 | Compound, colorant including the same, positive photosensitive resin composition including the same and color filter | SAMSUNG SDI CO., LTD. (KR) | 2018-07-24 | — | — | US | disclosed |
| US-10007028-B2 | Photosensitive resin composition and color filter using the same | SAMSUNG SDI CO., LTD. (KR) | 2018-06-26 | — | — | US | disclosed |
| US-20140175343-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-26 | — | — | US | disclosed |
| US-20140178815-A1 | Photosensitive Resin Composition for Light Blocking Layer and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-26 | — | — | US | disclosed |
| US-20140175342-A1 | Photosensitive Resin Composition, and Light Blocking Layer and Liquid Crystal Display Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-26 | — | — | US | disclosed |
| US-20140163131-A1 | Photosensitive Resin Composition and Black Spacer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-12 | — | — | US | disclosed |
| US-8715895-B2 | Photosensitive resin composition for color filter and color filter using the same | CHEIL INDUSTRIES INC. (KR) | 2014-05-06 | — | — | US | disclosed |
| US-8530537-B2 | Black photosensitive resin composition and light blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2013-09-10 | — | — | US | disclosed |
| US-20130164683-A1 | Photosensitive Resin Composition for Color Filter and Color Filter Using the Same | CHEIL INDUSTRIES INC. (KR) | 2013-06-27 | — | — | US | disclosed |
| US-20120077897-A1 | Black Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2012-03-29 | — | — | US | disclosed |
| US-7851789-B2 | Photosensitive resin composition for pad protective layer, and method for making image sensor using the same | CHEIL INDUSTRIES INC. (KR) | 2010-12-14 | — | — | US | disclosed |
| US-20090146236-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PAD PROTECTIVE LAYER, AND METHOD FOR MAKING IMAGE SENSOR USING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-06-11 | — | — | US | disclosed |