⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2114831 | 1.00 | — | — | |
| Butane SCHEMBL3380761 | 0.97 | — | — | |
| SCHEMBL27814 | 0.90 | CA1 (0.30) | — | |
| SCHEMBL3871723 | 0.89 | ADRB2 (0.36) | — | |
| SCHEMBL1706451 | 0.87 | — | — | |
| Fluoride SCHEMBL27875582 | 0.87 | — | — | |
| Bromide SCHEMBL9709407 | 0.87 | — | — | |
| SCHEMBL2805172 | 0.87 | — | — | |
| SCHEMBL2114051 | 0.86 | — | — | |
| SCHEMBL10887826 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2272878-B1 | Coupled polymers and manufacturing method thereof | TSRC CORP (TW) | 2013-12-18 | — | — | EP | claimed |
| US-8481649-B2 | Coupled polymers and manufacturing method thereof | TSRC CORPORATION (TW) | 2013-07-09 | — | — | US | claimed |
| US-20110009588-A1 | COUPLED POLYMERS AND MANUFACTURING METHOD THEREOF | TSRC CORPORATION (TW) | 2011-01-13 | — | — | US | claimed |
| EP-2272878-A1 | Coupled polymers and manufacturing method thereof | TSRC Corporation (TW) | 2011-01-12 | — | — | EP | claimed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230279173-A1 | Compositions Based on Multi-Block Polyolefin Copolymers | Kraton Corporation (US) | 2023-09-07 | — | — | US | disclosed |
| EP-4239024-A2 | COMPOSITIONS BASED ON MULTI-BLOCK POLYOLEFIN COPOLYMERS | Kraton Polymers Nederland B.V. (NL) | 2023-09-06 | — | — | EP | disclosed |
| CN-116693780-A | Compositions based on multiblock polyolefin copolymers | 科腾聚合物荷兰有限责任公司 | 2023-09-05 | — | — | CN | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6767839-B1 | Method for forming multi-layer wiring structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| US-5614251-A | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-03-25 | — | — | US | disclosed |
| US-5496402-A | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | TOKYO OHKA KOGYO CO, LTD. (JP) | 1996-03-05 | — | — | US | disclosed |