SCHEMBL863328

SCHEMBL863328

Nc1ccc(Oc2ccc(N)c(F)c2)cc1F

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.61
ALDH1A1 P00352 7/20 0.54
SOS1 Q07889 2/20 0.46
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA4 P22748 1/20 0.43
CA6 P23280 1/20 0.43
CA5A P35218 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
GAA P10253 2/20 0.43
MAPT P10636 2/20 0.43
MEN1 O00255 1/20 0.43
MITF O75030 1/20 0.43
GFER P55789 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31522011 0.93 SOS1 (0.55) NR4A1ALDH1A1SOS1CA12CA1
SCHEMBL29394218 0.91 ALDH1A1 (0.58) NR4A1ALDH1A1SOS1CA12CA1
SCHEMBL30127396 0.89 MAOA (0.54) NR4A1ALDH1A1SOS1SMN1; SMN2GAA
SCHEMBL16792619 0.89 MAOA (0.54) NR4A1ALDH1A1SOS1SMN1; SMN2GAA
SCHEMBL10704338 0.88 MEN1 (0.54) NR4A1ALDH1A1SOS1SMN1; SMN2GAA
SCHEMBL23637719 0.86 NR4A1 (0.47) NR4A1ALDH1A1SOS1CA12CA1
SCHEMBL29397217 0.86 NR4A1 (0.47) NR4A1ALDH1A1SOS1CA12CA1
SCHEMBL21359775 0.86 MAOB (0.60) NR4A1ALDH1A1SMN1; SMN2GAAMAPT
SCHEMBL5737664 0.86 NR4A1 (0.47) NR4A1ALDH1A1SOS1CA12CA1
SCHEMBL18332124 0.86 ALDH1A1 (0.52) NR4A1ALDH1A1SMN1; SMN2GAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11584651-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2023-02-21 US disclosed
EP-3042877-B1 POROUS CARBON AND ITS USE AS HUMIDITY-CONTROLLING ADSORBENT MATERIAL, AS ADSORBENT IN A HEAT PUMP OR AS ELECTRODE IN A FUEL CELL TOYO TANSO CO (JP) 2021-02-17 EP disclosed
US-10137405-B2 Porous carbon, humidity control adsorbent, adsorption heat pump, and fuel cell TOYO TANSO CO., LTD. (JP) 2018-11-27 US disclosed
US-20160199809-A1 POROUS CARBON, HUMIDITY CONTROL ADSORBENT, ADSORPTION HEAT PUMP, AND FUEL CELL TOYO TANSO CO., LTD. (JP) 2016-07-14 US disclosed
EP-3042877-A1 POROUS CARBON, HUMIDITY-CONTROLLING ADSORBENT MATERIAL, ADSORPTION-TYPE HEAT PUMP, AND FUEL CELL Toyo Tanso Co., Ltd. (JP) 2016-07-13 EP disclosed
US-9248442-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2016-02-02 US disclosed
EP-2975002-A1 ADSORBING/DESORBING MATERIAL Toyo Tanso Co., Ltd. (JP) 2016-01-20 EP disclosed
US-20150367323-A1 ADSORBING/DESORBING AGENT TOYO TANSO CO., LTD. (JP) 2015-12-24 US disclosed
US-20150344316-A1 POROUS CARBON AND METHOD OF MANUFACTURING SAME TOYO TANSO CO., LTD. (JP) 2015-12-03 US disclosed
US-9156694-B2 Porous carbon and method of manufacturing same TOYO TANSO CO., LTD. (JP) 2015-10-13 US disclosed
US-20040234222-A1 Optical element, method of producing optical elements, coating device, and coating method HITACHI CHEMICAL COMPANY, LTD. (JP) 2004-11-25 US disclosed
US-6810181-B2 LAYER OF A FLUORINE-CONTAINING POLYIMIDE AND A LAYER OF A FLUORINE-FREE RESIN IS INTERPOSED BETWEEN THE POLYIMIDE LAYER AND THE ELECTRODE HITACHI CHEMICAL CO., LTD. (JP) 2004-10-26 US disclosed
US-20040096161-A1 Electrode structure HITACHI CHEMICAL CO., LTD. (JP) 2004-05-20 US disclosed
US-20030054184-A1 Optical element, method for the production thereof and optical module HITACHI CHEMICAL CO., LTD. (JP) 2003-03-20 US disclosed
US-6001277-A Liquid-crystal alignment film HITACHI CHEMICAL COMPANY, LTD. (JP) 1999-12-14 US disclosed
US-5571579-A FORMING A POLYIMIDE FILM AND RUBBING THE SURFACE OF THE FILM HITACHI CHEMICAL COMPANY, LTD (JP) 1996-11-05 US disclosed
EP-0450926-B1 Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL CO LTD (JP) 1996-07-31 EP disclosed
US-5401878-A Fluorinated unsaturated alkyl ether aryldiamines for polyimide polymers with heat resistance and waterproofing HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-03-28 US disclosed
US-5270438-A Fluorine-containing polyimides and precursors thereof HITACHI CHEMICAL COMPANY, LTD. (JP) 1993-12-14 US disclosed
EP-0450926-A2 Fluorine-containing polyimides and precursors thereof Hitachi Chemical Co., Ltd. (JP) 1991-10-09 EP disclosed