Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | CTSD | P07339 | 1/20 | 0.35 |
| ▸ | KDM5C | P41229 | 1/20 | 0.35 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.35 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | FAAH | O00519 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | CASP2 | P42575 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6222618 | 0.91 | ALDH1A1 (0.46) | TSHRRECQLKDM4EALDH1A1FAAH | |
| SCHEMBL11505724 | 0.90 | RECQL (0.58) | TSHRRECQLALDH1A1FAAHGAA | |
| SCHEMBL17049333 | 0.87 | — | — | |
| SCHEMBL8644277 | 0.86 | TSHR (0.38) | TSHRRECQLCTSDALDH1A1GAA | |
| SCHEMBL24070642 | 0.84 | TSHR (0.64) | TSHRRECQLKDM4EALDH1A1FAAH | |
| SCHEMBL22746115 | 0.84 | FAAH (0.52) | TSHRRECQLALDH1A1FAAHCASP2 | |
| SCHEMBL15671630 | 0.84 | TSHR (0.39) | TSHRRECQLKDM4ELMNAHPGD | |
| SCHEMBL6500143 | 0.82 | TSHR (0.42) | TSHRRECQLKDM4EALDH1A1GAA | |
| SCHEMBL4849009 | 0.82 | FAAH (0.61) | TSHRRECQLFAAHCASP2MEN1 | |
| SCHEMBL1965413 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0458325-B1 | Negative photosensitive composition and method for forming a resist pattern | MITSUBISHI CHEM CORP (JP) | 1998-08-19 | — | — | EP | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |