SCHEMBL8645384

SCHEMBL8645384

CC(C)(C)Oc1cccc(S(OS(=O)(=O)CC(F)(F)F)(c2ccccc2)c2cccc(OC(C)(C)C)c2)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGES2 Q9H7Z7 2/20 0.39
CETP P11597 2/20 0.38
KAT6A Q92794 1/20 0.36
HDAC3 O15379 1/20 0.35
HDAC4 P56524 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC7 Q8WUI4 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC10 Q969S8 1/20 0.35
HDAC11 Q96DB2 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
HDAC9 Q9UKV0 1/20 0.35
HDAC5 Q9UQL6 1/20 0.35
ALDH1A1 P00352 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2C9 P11712 1/20 0.34
HPGD P15428 1/20 0.34
CYP2C19 P33261 1/20 0.34
ABCC9 O60706 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8647880 1.00 PTGES2 (0.39) PTGES2CETPKAT6AHDAC3HDAC4
SCHEMBL8646470 0.96 HDAC3 (0.37) PTGES2CETPKAT6AHDAC3HDAC4
SCHEMBL8644626 0.89 GRM2 (0.33) PTGES2CETPHDAC3HDAC4HDAC1
SCHEMBL8647797 0.89 GRM2 (0.33) PTGES2CETPHDAC3HDAC4HDAC1
SCHEMBL8651818 0.88 HSD11B1 (0.38) ALDH1A1CYP3A4CYP2C19ABCC9ABCC8
SCHEMBL8646731 0.88 HSD11B1 (0.38) ALDH1A1CYP3A4CYP2C19ABCC9ABCC8
SCHEMBL8317619 0.87 PTGES2 (0.37) PTGES2KAT6ATAS2R14HSD11B1PGR
SCHEMBL8651442 0.84 RORA (0.35) PTGES2CETPALDH1A1CYP3A4CYP2C9
SCHEMBL8646164 0.84 CYP3A4 (0.39) KAT6AHDAC3HDAC4HDAC1HDAC7
SCHEMBL8648382 0.84 CYP3A4 (0.39) KAT6AHDAC3HDAC4HDAC1HDAC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5824824-A AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-10-20 US disclosed