SCHEMBL8646193

SCHEMBL8646193

C=C(C)C#N.C=CCC(=O)O

nearest known ligand 0.48

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.48
ALDH1A1 P00352 3/20 0.35
ALOX15 P16050 2/20 0.35
CYP2D6 P10635 1/20 0.35
TSHR P16473 1/20 0.32
ABCC4 O15439 1/20 0.30
MAPT P10636 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2037957 0.84 ALOX15 (0.36) ALDH1A1ALOX15CYP2D6ABCC4MAPT
Acetone SCHEMBL7158493 0.81 ALDH1A1 (0.45) ALDH1A1ALOX15CYP2D6TSHRABCC4
Acetic Acid SCHEMBL10534954 0.81 ALDH1A1 (0.45) ALDH1A1ALOX15CYP2D6TSHRABCC4
Acetic Acid SCHEMBL1816061 0.81 ALDH1A1 (0.45) ALDH1A1ALOX15CYP2D6TSHRABCC4
SCHEMBL28218949 0.81 ALDH1A1 (0.35) ALDH1A1ALOX15CYP2D6TSHRHSD17B10
Water SCHEMBL4563847 0.81
Methacrylic Acid SCHEMBL1274003 0.79 ALDH1A1 (0.39) TDP1ALDH1A1ALOX15CYP2D6TSHR
Acrylonitrile SCHEMBL2578377 0.79 ALDH1A1 (0.45) ALDH1A1ALOX15CYP2D6TSHRABCC4
Acetic Acid SCHEMBL28013440 0.79 ALDH1A1 (0.43) ALDH1A1ALOX15CYP2D6TSHRABCC4
Acetic Acid SCHEMBL28282237 0.79 ALDH1A1 (0.43) ALDH1A1ALOX15CYP2D6TSHRABCC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104471482-B The manufacturing method of photoresist element 旭化成株式会社 2019-08-02 CN disclosed
CN-106393838-B Photoresist laminated body is rolled up 旭化成株式会社 2018-09-28 CN disclosed
CN-106164192-B Bright coating composition 关西涂料株式会社 2017-12-19 CN disclosed
CN-106966074-A Photoresist layered product is rolled up 旭化成株式会社 2017-07-21 CN disclosed
CN-104903207-B Photosensitive resin laminate roll 旭化成株式会社 2017-04-05 CN disclosed
CN-106393838-A Photosensitive resin laminate roll 旭化成株式会社 2017-02-15 CN disclosed
CN-106164192-A Bright coating composition 关西涂料株式会社 2016-11-23 CN disclosed
EP-0614767-B1 Aqueous resin dispersion liquid for heat-sensitive recording material and heat-sensitive recording material using the same NIPPON CATALYTIC CHEM IND (JP) 1998-09-09 EP disclosed
EP-0614767-A1 Aqueous resin dispersion liquid for heat-sensitive recording material and heat-sensitive recording material using the same NIPPON SHOKUBAI CO., LTD. (JP) 1994-09-14 EP disclosed
EP-0182516-B1 AQUEOUS EMULSION OF ACRYLIC ACID COPOLYMER NITTO DENKO CORPORATION (JP) 1991-03-13 EP disclosed