Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.47 |
| ▸ | NT5E | P21589 | 2/20 | 0.47 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 4/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.44 |
| ▸ | THRB | P10828 | 2/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | CA12 | O43570 | 2/20 | 0.44 |
| ▸ | CA1 | P00915 | 2/20 | 0.44 |
| ▸ | CA2 | P00918 | 2/20 | 0.44 |
| ▸ | CA9 | Q16790 | 2/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 6/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25434549 | 1.00 | ALDH1A1 (0.47) | ALDH1A1TSHRNT5ERAPGEF4RECQL | |
| SCHEMBL714945 | 0.92 | HSD17B10 (0.44) | ALDH1A1TSHRNT5ERAPGEF4RECQL | |
| SCHEMBL8663388 | 0.87 | ALDH1A1 (0.50) | ALDH1A1TSHRNT5EHSD17B10CA12 | |
| SCHEMBL5973210 | 0.87 | IKBKB (0.51) | ALDH1A1RECQLCYP3A4HSD17B10ALOX15 | |
| SCHEMBL8594388 | 0.86 | ALDH1A1 (0.48) | ALDH1A1TSHRNT5ERAPGEF4RECQL | |
| SCHEMBL9164238 | 0.85 | CTDSP1 (0.38) | ALDH1A1TSHRRAPGEF4RECQLCYP3A4 | |
| SCHEMBL115254 | 0.84 | ALDH1A1 (0.55) | ALDH1A1TSHRNT5ERAPGEF4RECQL | |
| SCHEMBL29349546 | 0.84 | ALDH1A1 (0.55) | ALDH1A1TSHRNT5ERAPGEF4RECQL | |
| SCHEMBL11122407 | 0.82 | CA2 (0.55) | ALDH1A1TSHRCYP3A4HSD17B10ALOX15 | |
| Ammonia Solution, Strong SCHEMBL7551537 | 0.82 | ALDH1A1 (0.53) | ALDH1A1TSHRNT5ERAPGEF4RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112679731-B | Covalent organic framework material containing sulfonic acid group and preparation and application thereof | 同济大学 | 2022-08-23 | — | — | CN | claimed |
| CN-113039237-A | Polyimide film, polyimide composition, and method for producing film using same | 株式会社东进世美肯 | 2021-06-25 | — | — | CN | claimed |
| CN-112679731-A | Covalent organic framework material containing sulfonic acid group and preparation and application thereof | 同济大学 | 2021-04-20 | — | — | CN | claimed |
| US-10961342-B2 | Resin formulation and uses thereof | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2021-03-30 | — | — | US | claimed |
| CN-108148507-B | Polishing composition for fused quartz | 清华大学 | 2020-12-04 | — | — | CN | claimed |
| US-20200087443-A1 | A Resin Formulation and Uses Thereof | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2020-03-19 | — | — | US | claimed |
| EP-1599555-B1 | CMP COMPOSITION COMPRISING A SULFONIC ACID AND A METHOD FOR POLISHING NOBLE METALS | CABOT MICROELECTRONICS CORP (US) | 2019-06-12 | — | — | EP | claimed |
| WO-2018080397-A1 | A RESIN FORMULATION AND USES THEREOF | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2018-05-03 | — | — | WO | claimed |
| JP-4709136-B2 | — | — | 2011-06-22 | — | — | JP | claimed |
| JP-4445553-B2 | — | — | 2010-04-07 | — | — | JP | claimed |
| JP-2008512561-A | — | — | 2008-04-24 | — | — | JP | claimed |
| WO-2007055459-A1 | BRANCHED MULTIBLOCK POLYBENZIMIDAZOLE-BENZAMIDE COPOLYMER AND METHOD FOR PREPARING THE SAME, ELECTROLYTE MEMBRANE AND PASTE/GEL PREPARED THEREFROM | LG CHEM, LTD. (KR) | 2007-05-18 | — | — | WO | claimed |
| US-20070111075-A1 | Branched multiblock polybenzimidazole-benzamide copolymer and method for preparing the same, electrolyte membrane and paste/gel prepared therefrom | LG CHEM, LTD. (KR) | 2007-05-17 | — | — | US | claimed |
| US-7097541-B2 | CMP method for noble metals | CABOT MICROELECTRONICS CORPORATION (US) | 2006-08-29 | — | — | US | claimed |
| EP-1599555-A2 | CMP COMPOSITION COMPRISING A SULFONIC ACID AND A METHOD FOR POLISHING NOBLE METALS | Cabot Microelectronics Corporation (US) | 2005-11-30 | — | — | EP | claimed |
| WO-2004076574-A2 | CMP COMPOSITION COMPRISING A SULFONIC ACID AND A METHOD FOR POLISHING NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2004-09-10 | — | — | WO | claimed |
| US-20030181142-A1 | CMP method for noble metals | CABOT MICROELECTRONICS CORPORATION | 2003-09-25 | — | — | US | claimed |
| US-4520075-A | ADHESION, WATERPROOF COATING | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1985-05-28 | — | — | US | claimed |
| US-4499252-A | Process for producing polyimide precursor | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1985-02-12 | — | — | US | claimed |
| US-4118349-A | Process for the manufacture of polystyrene latex compounds | BEHRINGWERKE AKTIENGESELLSCHAFT (DE) | 1978-10-03 | — | — | US | claimed |