SCHEMBL8665792

SCHEMBL8665792

C=Cc1ccccc1/C=C(\C#N)C(=O)O

nearest known ligand 0.60

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 3/20 0.60
▸ LMNA P02545 2/20 0.60
▸ PKM P14618 1/20 0.60
▸ KMT2A Q03164 1/20 0.60
▸ EGFR P00533 4/20 0.51
▸ GPR55 Q9Y2T6 1/20 0.49
▸ SLC16A3 O15427 2/20 0.49
▸ SLC16A1 P53985 2/20 0.49
▸ CISD1 Q9NZ45 1/20 0.49
▸ ALDH1A1 P00352 1/20 0.49
▸ CYP3A4 P08684 1/20 0.49
▸ HPGD P15428 1/20 0.49
▸ GPR35 Q9HC97 1/20 0.49
▸ CRHBP P24387 1/20 0.46
▸ CRHR2 Q13324 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2058767 0.81 EGFR (0.66) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL393439 0.81 EGFR (0.66) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL4661300 0.80 CRHBP (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL4661306 0.80 CRHBP (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL1711227 0.79 KDM4E (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL1711226 0.79 KDM4E (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL10733520 0.79 TRPA1 (0.61) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL9361224 0.79 KDM4E (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL2029718 0.79 KDM4E (0.60) KDM4ELMNAPKMKMT2AEGFR
SCHEMBL9361219 0.79 KDM4E (0.60) KDM4ELMNAPKMKMT2AEGFR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0883016-A1 Method for producing phase retarder films SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-12-09 — — EP disclosed
US-4591544-A Metal image forming materials with light sensitive resin layer and oblique angle deposited metal underlayer KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-05-27 — — US disclosed
US-4442196-A ADDITION POLYMER HAVING SOME AZIDO-CINNAMYLIDENE-ALPHA-CYANOACETATE GROUPS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-04-10 — — US disclosed
EP-0082588-A2 Photolithographic elements for the production of metal images KONICA CORPORATION (JP) 1983-06-29 — — EP disclosed
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