⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15608297 | 0.96 | — | — | |
| SCHEMBL786428 | 0.88 | ALDH1A1 (0.31) | — | |
| SCHEMBL30965350 | 0.87 | — | — | |
| SCHEMBL757673 | 0.86 | THRB (0.33) | — | |
| SCHEMBL30720031 | 0.86 | ALDH1A1 (0.34) | — | |
| SCHEMBL29411106 | 0.86 | ALDH1A1 (0.34) | — | |
| SCHEMBL8669272 | 0.85 | ALDH1A1 (0.31) | — | |
| SCHEMBL1332150 | 0.85 | THRB (0.32) | — | |
| SCHEMBL1332821 | 0.85 | THRB (0.32) | — | |
| SCHEMBL535075 | 0.84 | THRB (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5728508-A | Method of forming resist pattern utilizing fluorinated resin antireflective film layer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-03-17 | — | — | US | disclosed |