SCHEMBL8670491

SCHEMBL8670491

OC(F)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1991276 0.97 THRB (0.32)
SCHEMBL11651272 0.97 THRB (0.32)
SCHEMBL905510 0.97 THRB (0.32)
SCHEMBL3686415 0.97 THRB (0.32)
SCHEMBL22028096 0.81
SCHEMBL8576086 0.79 LMNA (0.33)
SCHEMBL3454948 0.78 THRB (0.30)
SCHEMBL2788566 0.78 THRB (0.30)
SCHEMBL5054391 0.78 LMNA (0.36)
SCHEMBL1830167 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111904907-A Efficient decontamination and bacteriostasis hand sanitizer and preparation method thereof 邓文鹏 2020-11-10 CN claimed
CN-114502554-A Metal complex and electron transport material using the same 大电株式会社 2022-05-13 CN disclosed
CN-109689665-B Metal complex and electron transport material using the same 大电株式会社 2021-10-01 CN disclosed
CN-112961102-A Metal complex and electron transport material using the same 大电株式会社 2021-06-15 CN disclosed
WO-2021066123-A1 METAL COMPLEX AND ELECTRON TRANSPORTING MATERIAL COMPRISING SAME 大電株式会社 2021-04-08 WO disclosed
CN-111904907-A Efficient decontamination and bacteriostasis hand sanitizer and preparation method thereof 邓文鹏 2020-11-10 CN disclosed
EP-2344562-B1 FLUOROPOLYMER COMPOSITIONS AND TREATED SUBSTRATES CHEMOURS CO FC LLC (US) 2019-05-22 EP disclosed
US-10175576-B2 Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2019-01-08 US disclosed
US-20150185606-A1 CURABLE COMPOSITION FOR PHOTO IMPRINTS, METHOD FOR FORMING PATTERN, FINE PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed
EP-0882010-A1 PHARMACEUTICAL AGENTS CONTAINING PERFLUOROALKYL-CONTAINING METAL COMPLEXES AND THE USE THEREOF IN TUMOUR THERAPY AND INTERVENTIONAL RADIOLOGY SCHERING AKTIENGESELLSCHAFT (DE) 1998-12-09 EP disclosed
WO-1997030969-A1 PHARMACEUTICAL AGENTS CONTAINING PERFLUOROALKYL-CONTAINING METAL COMPLEXES AND THE USE THEREOF IN TUMOUR THERAPY AND INTERVENTIONAL RADIOLOGY SCHERING AKTIENGESELLSCHAFT (DE) 1997-08-28 WO disclosed
US-4954409-A FLUORINATED ACRYLIC POLYMER FUJI XEROX CO., LTD. (JP) 1990-09-04 US disclosed