⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11573768 | 0.78 | TSHR (0.35) | — | |
| SCHEMBL21538628 | 0.76 | — | — | |
| SCHEMBL36898 | 0.76 | — | — | |
| SCHEMBL13408640 | 0.76 | — | — | |
| Methoxymethane SCHEMBL27630769 | 0.76 | CAD (0.35) | — | |
| SCHEMBL10899226 | 0.74 | — | — | |
| SCHEMBL11851799 | 0.74 | — | — | |
| SCHEMBL9293414 | 0.70 | POLB (0.39) | — | |
| SCHEMBL238196 | 0.70 | SLC1A3 (0.38) | — | |
| SCHEMBL10571804 | 0.70 | CAD (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060137104-A1 | Method of producing fabric | ZHANG YU-GAO | 2006-06-29 | — | — | US | claimed |
| EP-1492918-A4 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO L (CN) | 2006-06-21 | — | — | EP | claimed |
| EP-1492918-A2 | METHOD OF PRODUCING FABRIC | Guangdong Esquel Kniiters Co., Ltd. (CN) | 2005-01-05 | — | — | EP | claimed |
| WO-2003060222-A2 | METHOD OF PRODUCING FABRIC | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | WO | claimed |
| US-20030135932-A1 | Method of producing fabric | GUANGDONG ESQUEL KNITTERS CO., LTD. (CN) | 2003-07-24 | — | — | US | claimed |
| US-20030129538-A1 | Method for eliminating corner round profile of the RELACS process | MACRONIX INTERNATIONAL CO., LTD. | 2003-07-10 | — | — | US | claimed |
| JP-56104958-A | — | — | None | — | — | JP | disclosed |
| US-9304399-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| US-20140273513-A1 | RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140248777-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8765353-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20120077343-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-7922776-B2 | Shrinkage inhibition; wrinkle resistance; contacting cellulose with enzyme; then overcoating with polymer | ZHANG YU-GAO | 2011-04-12 | — | — | US | disclosed |
| US-20030077539-A1 | Negative- acting aqueous photoresist composition | MERCK PATENT GMBH (DE) | 2003-04-24 | — | — | US | disclosed |
| WO-2003029900-A1 | NEGATIVE-ACTING AQUEOUS PHOTORESIST COMPOSITION | CLARIANT INTERNATIONAL LTD (CH) | 2003-04-10 | — | — | WO | disclosed |
| US-20020037476-A1 | Resist pattern forming method, frame plating method and manufacturing method of thin-film magnetic head | TDK CORPORATION (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |
| US-5306435-A | Dimensional stability, shrinkage inhibition during washing | NIHON JUNYAKU CO., LTD. (JP) | 1994-04-26 | — | — | US | disclosed |
| JP-S56104958-A | FIRE RETARDANT GLASS FIBER STRUCTURE AND ITS BINDER | SANWA CHEM:KK | 1981-08-21 | — | — | JP | disclosed |
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | disclosed |