SCHEMBL8677173

SCHEMBL8677173

C=CC=CC(C=Cc1ccccc1)C(=C)C(=O)OCCCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.47
TDP1 Q9NUW8 3/20 0.46
POLB P06746 1/20 0.39
TSHR P16473 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
CYP3A4 P08684 3/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
BCHE P06276 4/20 0.36
ACHE P22303 2/20 0.36
ALDH1A1 P00352 2/20 0.36
LMNA P02545 2/20 0.36
GAA P10253 1/20 0.36
MAPT P10636 1/20 0.36
MAPK1 P28482 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8675032 0.96 KDM4E (0.43) KDM4ETDP1POLBTSHRCYP3A4
SCHEMBL8675986 0.88 MEN1 (0.47) KDM4EL3MBTL1MEN1KMT2ACYP3A4
SCHEMBL6686282 0.83 MEN1 (0.42) KDM4ETSHRMEN1KMT2ACYP3A4
SCHEMBL3400829 0.83 SMN1; SMN2 (0.43) KDM4ETDP1TSHRL3MBTL1CYP3A4
SCHEMBL34195 0.82 CYP3A4 (0.41) TDP1MEN1KMT2ACYP3A4CYP2C9
SCHEMBL4445614 0.79 HPGD (0.40) KDM4ETDP1TSHRBCHEACHE
SCHEMBL11317319 0.79 KDM4E (0.43) KDM4ETDP1POLBTSHRL3MBTL1
Vinyl Chloride SCHEMBL9625391 0.79 LMNA (0.39) TDP1TSHRMEN1KMT2ACYP3A4
SCHEMBL5162573 0.79 TSHR (0.46) KDM4ETDP1POLBTSHRCYP3A4
SCHEMBL10455816 0.78 HPGD (0.43) KDM4ETDP1TSHRL3MBTL1BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5763515-A COMPRISING AN IMPACT ADDITIVES FOR IMPROVING THE IMPACT STRENGTH ELF ATOCHEM NORTH AMERICA INC. (US) 1998-06-09 US disclosed
US-5693699-A INCLUDING METHACRYLIC ALKYL ESTER-BUTADIENE-STYRENE RESIN OR AN ACRYLIC RESIN; IMPACT STRENGTH; MATERIALS HANDLING; STORAGE STABILITY ELF ATOCHEM NORTH AMERICA INC. (US) 1997-12-02 US disclosed
CN-1025344-C Composition coextrudable with polyvinylidene fluoride to bond with incompatible polymer resins, and composite material made with the composition ATOCHEM (FR) 1994-07-06 CN disclosed
CN-1054431-A The matrix material that can make the composition of itself and incompatible polymers resin bond, make with said composition with the poly(vinylidene fluoride) co-extrusion ATOCHEM (FR) 1991-09-11 CN disclosed