⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL868959 | 1.00 | — | — | |
| SCHEMBL98625 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL869410 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL29045247 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL353476 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL869643 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL868958 | 0.86 | SLC22A6 (0.35) | — | |
| SCHEMBL1171217 | 0.85 | FOLH1 (0.41) | — | |
| SCHEMBL16536081 | 0.82 | RNPEP (0.35) | — | |
| SCHEMBL1171017 | 0.82 | RNPEP (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 262 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3145723-B1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH CO LTD (JP) | 2018-09-05 | — | — | EP | claimed |
| US-9757944-B2 | Liquid jet head and method for producing same, and liquid jet apparatus and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2017-09-12 | — | — | US | claimed |
| EP-3145723-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | Ricoh Company, Ltd. (JP) | 2017-03-29 | — | — | EP | claimed |
| US-20170043580-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2017-02-16 | — | — | US | claimed |
| EP-2436715-B1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO KK (JP) | 2016-08-24 | — | — | EP | claimed |
| WO-2015178010-A1 | LIQUID JET HEAD AND METHOD FOR PRODUCING SAME, AND LIQUID JET APPARATUS AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2015-11-26 | — | — | WO | claimed |
| US-8865801-B2 | Epoxy resin-based coating composition | SHOWA DENKO K.K. (JP) | 2014-10-21 | — | — | US | claimed |
| US-20120077903-A1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO K.K. (JP) | 2012-03-29 | — | — | US | claimed |
| US-7989567-B2 | Method for production of water/oil repellent composition and article | ASAHI GLASS COMPANY, LIMITED (JP) | 2011-08-02 | — | — | US | claimed |
| US-12637544-B2 | UV curable silicone composition and cured product thereof | DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) | 2026-05-26 | — | — | US | disclosed |
| US-20260139157-A1 | THERMAL-AND-UV-CURABLE (METH)ACRYLATE COMPOSITION | HENKEL AG & CO KGAA (DE) | 2026-05-21 | — | — | US | disclosed |
| US-12624279-B2 | Quantum dot-containing polymerizable composition, cured product, wavelength conversion member, backlight unit, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2026-05-12 | — | — | US | disclosed |
| EP-4703778-A1 | WAVELENGTH CONVERSION SHEET, BACKLIGHT, AND LIQUID CRYSTAL DISPLAY DEVICE | Dai Nippon Printing Co., Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-12565548-B2 | Compound, polymerizable composition, and cured product | FUJIFILM CORPORATION (JP) | 2026-03-03 | — | — | US | disclosed |
| US-20060079593-A1 | Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same | SHOWA DENKO K.K. (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1629046-A2 | CURABLE POLYMER COMPOUND | Showa Denko K.K. (JP) | 2006-03-01 | — | — | EP | disclosed |
| US-20060041053-A1 | Color filter black matrix resist composition and carbon black dispersion composition used for the composition | SHOWA DENKO K.K. (JP) | 2006-02-23 | — | — | US | disclosed |
| US-20060036023-A1 | Color filter black matrix resist composition | SHOWA DENKO K.K. (JP) | 2006-02-16 | — | — | US | disclosed |
| US-20050153231-A1 | Thiol compound, photopolymerization initiator composition and photosensitive composition | SHOWA DENKO K.K. (JP) | 2005-07-14 | — | — | US | disclosed |
| WO-2004106431-A2 | CURABLE POLYMER COMPOUND | SHOWA DENKO K.K. (JP) | 2004-12-09 | — | — | WO | disclosed |