Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.48 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.48 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4948009 | 1.00 | MGLL (0.49) | MGLLALDH1A1HCAR2KEAP1NFE2L2 | |
| SCHEMBL4948022 | 1.00 | MGLL (0.49) | MGLLALDH1A1HCAR2KEAP1NFE2L2 | |
| SCHEMBL624267 | 0.90 | MGLL (0.55) | MGLLALDH1A1TP53CYP3A4 | |
| SCHEMBL268634 | 0.90 | MGLL (0.55) | MGLLALDH1A1TP53CYP3A4 | |
| SCHEMBL268635 | 0.90 | MGLL (0.55) | MGLLALDH1A1TP53CYP3A4 | |
| SCHEMBL1286819 | 0.85 | HCAR2 (0.52) | MGLLALDH1A1HCAR2TP53CYP3A4 | |
| SCHEMBL1286817 | 0.85 | HCAR2 (0.52) | MGLLALDH1A1HCAR2TP53CYP3A4 | |
| SCHEMBL8054471 | 0.85 | HCAR2 (0.52) | MGLLALDH1A1HCAR2TP53CYP3A4 | |
| Ethane SCHEMBL2120677 | 0.84 | MGLL (0.51) | MGLLALDH1A1HCAR2TP53CYP3A4 | |
| SCHEMBL422856 | 0.83 | MGLL (0.54) | MGLLALDH1A1HCAR2TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10179835-B2 | Radical crosslinking of polyether carbonate polyols that have electron-poor and electron-rich double bonds | COVESTRO DEUTSCHLAND AG (DE) | 2019-01-15 | — | — | US | disclosed |
| US-20160200865-A1 | RADICAL CROSSLINKING OF POLYETHER CARBONATE POLYOLS THAT HAVE ELECTRON-POOR AND ELECTRON-RICH DOUBLE BONDS | COVESTRO DEUTSCHLAND AG (DE) | 2016-07-14 | — | — | US | disclosed |
| CN-1957024-A | Particle with rough surface and process for producing the same | NISSHIN SPINNING (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1957023-A | Particle with rough surface for plating or vapor deposition | NISSHIN SPINNING (JP) | 2007-05-02 | — | — | CN | disclosed |
| CN-1681871-A | Flaky particles and process for production thereof | NISSHIN SPINNING (JP) | 2005-10-12 | — | — | CN | disclosed |
| CN-1073137-C | curable resin composition for water-based paint | DAINIPPON INK & CHEMICALS (JP) | 2001-10-17 | — | — | CN | disclosed |
| US-5811492-A | HAVING EXCELLENT HEAT, FIRE, CHEMICAL AND IMPACT RESISTANCE, MECHANICAL STRENGTH, AND MOLDABILITY; CONTAINING AMINO GROUPS, HYDROGENATED BLOCK COPOLYMER AND A POLYAMIDE RESIN | GENERAL ELECTRIC COMPANY (US) | 1998-09-22 | — | — | US | disclosed |
| CN-1178546-A | Curable resin composition for water-based paints | DAINIPPON INK & CHEMICALS (JP) | 1998-04-08 | — | — | CN | disclosed |
| US-5523358-A | REACTING POLYOLEFIN WITH ETHYLENICALLY UNSATURATED COMPOUND IN THE PRESENCE OF FREE RADICAL INITIATOR | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1996-06-04 | — | — | US | disclosed |
| EP-0370753-B1 | Modified polyolefin particles and process for preparation thereof | MITSUI PETROCHEMICAL IND (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0370753-A2 | Modified polyolefin particles and process for preparation thereof | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-05-30 | — | — | EP | disclosed |