⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10673601 | 1.00 | — | — | |
| SCHEMBL15317975 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL10674883 | 0.97 | TSHR (0.37) | — | |
| Hydrochloric Acid SCHEMBL10594297 | 0.97 | TSHR (0.37) | — | |
| SCHEMBL28243404 | 0.97 | TSHR (0.37) | — | |
| SCHEMBL19903775 | 0.84 | TSHR (0.38) | — | |
| SCHEMBL15133972 | 0.84 | FDPS (0.38) | — | |
| SCHEMBL29003701 | 0.84 | MAPT (0.33) | — | |
| SCHEMBL7775089 | 0.84 | FDPS (0.38) | — | |
| SCHEMBL30353890 | 0.82 | TDP1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12359125-B2 | Silicon etchant composition, pattern formation method and manufacturing method of array substrate using the etchant composition, and array substrate manufactured therefrom | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-15 | — | — | US | claimed |
| US-20250026960-A1 | POLISHING SLURRY COMPOSITION | KCTECH CO.,LTD. (KR) | 2025-01-23 | — | — | US | claimed |
| CN-118339245-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-07-12 | — | — | CN | claimed |
| WO-2023121037-A1 | POLISHING SLURRY COMPOSITION | 주식회사 케이씨텍 | 2023-06-29 | — | — | WO | claimed |
| US-11384255-B2 | Polishing slurry composition for STI process | KCTECH CO., LTD. (KR) | 2022-07-12 | — | — | US | claimed |
| US-20220073819-A1 | SILICON ETCHANT COMPOSITION, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF ARRAY SUBSTRATE USING THE ETCHANT COMPOSITION, AND ARRAY SUBSTRATE MANUFACTURED THEREFROM | DONGWOO FINE-CHEM CO., LTD. (KR) | 2022-03-10 | — | — | US | claimed |
| US-20210163785-A1 | POLISHING SLURRY COMPOSITION FOR STI PROCESS | KCTECH CO., LTD. (KR) | 2021-06-03 | — | — | US | claimed |
| US-20210079262-A1 | POLISHING SLURRY COMPOSITION FOR STI PROCESS | KCTECH CO., LTD. (KR) | 2021-03-18 | — | — | US | claimed |
| US-20190316003-A1 | SLURRY COMPOSITION FOR POLISHING HIGH STEPPED REGION | KCTECH CO., LTD. (KR) | 2019-10-17 | — | — | US | claimed |
| CN-101208404-B | For the automatic stopping abrasive composition of polishing height ladder height oxide layer | TECHNO SEMICHEM Co.,Ltd. (KR) | 2016-02-03 | — | — | CN | claimed |
| US-20110124195-A1 | Chemical Mechanical Polishing Composition Containing Polysilicon Polish Finisher | TECHNO SEMICHEM CO., LTD. (KR) | 2011-05-26 | — | — | US | claimed |
| US-20110045741-A1 | Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide Layer | TECHNO SEMICHEM CO., LTD. (KR) | 2011-02-24 | — | — | US | claimed |
| CN-101208404-A | Auto-stopping abrasive composition for polishing high step height oxide layer | TECHNO SEMICHEM CO LTD (KR) | 2008-06-25 | — | — | CN | claimed |
| WO-2006115393-A1 | AUTO-STOPPING ABRASIVE COMPOSITION FOR POLISHING HIGH STEP HEIGHT OXIDE LAYER | TECHNO SEMICHEM CO., LTD. (KR) | 2006-11-02 | — | — | WO | claimed |
| US-20030027889-A1 | Antimicrobial paste glues | CREAVIS GESELLSCHAFT F. TECHN. U. INNOVATION MBH (DE) | 2003-02-06 | — | — | US | claimed |
| US-20030019813-A1 | Antimicrobial polymer foams with amino alcohols | DE GUSSA AG (DE) | 2003-01-30 | — | — | US | claimed |
| EP-1277820-A2 | Antimicrobial adhesives | Creavis Gesellschaft für Technologie und Innovation mbH (DE) | 2003-01-22 | — | — | EP | claimed |
| EP-1269843-A1 | Antimicrobial polymer foams with aminoalcohols | Creavis Gesellschaft für Technologie und Innovation mbH (DE) | 2003-01-02 | — | — | EP | claimed |
| US-20250236792-A1 | ETCHANT COMPOSITION FOR ETCHING SILICON AND METHOD OF FORMING PATTERN USING THE SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | disclosed |
| US-4128429-A | Antifouling quaternary halide salts containing a triorganotin ether moiety | SANKYO ORGANIC CHEMICALS COMPANY LIMITED (JP) | 1978-12-05 | — | — | US | disclosed |