SCHEMBL8724910

SCHEMBL8724910

CCCCOc1ccccc1C(=O)OO

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.67
MAPT P10636 2/20 0.67
CYP3A4 P08684 2/20 0.67
MEN1 O00255 1/20 0.67
NR1I2 O75469 1/20 0.67
CHRM2 P08172 1/20 0.67
ADRA2A P08913 1/20 0.67
OPRK1 P41145 1/20 0.67
HTR2B P41595 1/20 0.67
SLC6A3 Q01959 1/20 0.67
KMT2A Q03164 1/20 0.67
HDAC6 Q9UBN7 1/20 0.67
TSHR P16473 4/20 0.59
L3MBTL1 Q9Y468 2/20 0.59
TDP1 Q9NUW8 1/20 0.59
ALDH1A1 P00352 4/20 0.53
TP53 P04637 1/20 0.53
MAPK1 P28482 1/20 0.53
NPSR1 Q6W5P4 1/20 0.52
SMN1; SMN2 Q16637 2/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6466607 0.93 LMNA (0.77) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL6466640 0.93 LMNA (0.77) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL29196402 0.91 LMNA (0.59) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL6462760 0.90 LMNA (0.62) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL28811038 0.90 LMNA (0.62) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL7956581 0.88 MAPT (0.62) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL975212 0.88 TSHR (0.77) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL976078 0.87 TSHR (0.75) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL1006617 0.87 LMNA (0.59) LMNAMAPTCYP3A4MEN1NR1I2
SCHEMBL974445 0.87 TSHR (0.75) LMNAMAPTCYP3A4MEN1NR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109564399-A Liquid electrostatic printing method 惠普印迪戈股份公司 2019-04-02 CN disclosed
CN-108604072-A Electrostatic ink composition 惠普印迪戈股份公司 2018-09-28 CN disclosed
US-5716679-A Optical elements containing nanoscaled particles and having an embossed surface and process for their preparation INSTITUT FUR NEUE MATERIALIEN GEMEINNUTZIGE GMBH (DE) 1998-02-10 US disclosed