SCHEMBL8733252

SCHEMBL8733252

C=C(C)C(=O)OC(CC1=CCCC1)C1=CCCC1

nearest known ligand 0.31

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.31
KMT2A Q03164 2/20 0.31
MEN1 O00255 1/20 0.31
ATM Q13315 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30
HTT P42858 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8733563 0.80 GSTP1 (0.30)
SCHEMBL28207412 0.74 SMN1; SMN2 (0.32) SMN1; SMN2KMT2AMEN1ALDH1A1MAPT
SCHEMBL4872196 0.71 TSHR (0.46) KMT2AATMALDH1A1HTT
SCHEMBL8463984 0.70 KMT2A (0.31) KMT2AATMALDH1A1
SCHEMBL4872198 0.69 TSHR (0.33)
SCHEMBL1682390 0.68 ALDH1A1 (0.38) SMN1; SMN2ALDH1A1MAPTHTTHSD17B10
SCHEMBL10454906 0.67 KMT2A (0.31) KMT2AATMALDH1A1
Ethylene SCHEMBL12478059 0.67 ALDH1A1 (0.37) SMN1; SMN2ALDH1A1MAPTHTTHSD17B10
SCHEMBL4908236 0.66 TSHR (0.32) KMT2AATM
SCHEMBL28172172 0.66 ALDH1A1 (0.36) SMN1; SMN2KMT2AMEN1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114335895-A Functional layer material for coating lithium ion battery diaphragm 浙江杰特维新材料有限公司 2022-04-12 CN claimed
US-4388434-A ACRYLIC ESTER POLYMERS ROHM AND HAAS COMPANY (US) 1983-06-14 US claimed
CN-113423789-B Stabilized printing material 科迪华公司 2023-04-07 CN disclosed
CN-114502671-A Clear coating composition 株式会社KCC 2022-05-13 CN disclosed
CN-113423789-A Stabilized printing material 科迪华公司 2021-09-21 CN disclosed
US-9897729-B2 Photosensitive resin composition for color filter and application thereof CHI MEI CORPORATION (TW) 2018-02-20 US disclosed
US-20150315376-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2015-11-05 US disclosed
EP-0618244-B1 Multiple curable composition and use thereof NAT STARCH CHEM INVEST (US) 1998-07-15 EP disclosed
EP-0549116-B1 Method for coating printed circuit boards NAT STARCH CHEM INVEST (US) 1998-02-04 EP disclosed
EP-0618244-A2 Multiple curable composition and use thereof W.R. GRACE & CO.-CONN. (US) 1994-10-05 EP disclosed
US-5234970-A Conformal coatings W. R. GRACE & CO.-CONN. (US) 1993-08-10 US disclosed
EP-0549116-A2 Dual curing composition and use thereof W.R. Grace & Co.-Conn. (US) 1993-06-30 EP disclosed
US-4388434-A ACRYLIC ESTER POLYMERS ROHM AND HAAS COMPANY (US) 1983-06-14 US disclosed
US-4255196-A A CURABLE DILUENT DESCRIBED AS THE MIXED ESTERS OF A POLYOL WITH MIXED NATURAL DRYING OIL FATTY ACIDS AND AN UNSATURATED ACYCLIC ACID ROHM AND HAAS COMPANY (US) 1981-03-10 US disclosed
US-4253397-A COMPRISING A CURABLE LIQUID REACTIVE DILUENT WHICH IS A POLYUNSATURATED ESTER ROHM AND HAAS COMPANY (US) 1981-03-03 US disclosed
EP-0015147-A1 Lithographic ink containing oxidatively curable reactive diluent and use thereof ROHM AND HAAS COMPANY (US) 1980-09-03 EP disclosed