Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4872198 | 0.85 | TSHR (0.33) | TSHR | |
| SCHEMBL3421769 | 0.77 | TSHR (0.43) | TSHRALDH1A1THRBGSTP1 | |
| SCHEMBL128997 | 0.77 | TSHR (0.44) | TSHRALDH1A1POLBAPEX1HTT | |
| SCHEMBL29010382 | 0.76 | GSTP1 (0.43) | GSTP1KMT2AHDAC1HDAC2 | |
| Methacrylic Acid SCHEMBL25435014 | 0.76 | TSHR (0.41) | TSHRALDH1A1POLBAPEX1HTT | |
| SCHEMBL8463984 | 0.74 | KMT2A (0.31) | ALDH1A1KMT2AATM | |
| Acrylic Acid SCHEMBL8676132 | 0.73 | TSHR (0.38) | TSHR | |
| SCHEMBL29010386 | 0.73 | HCAR2 (0.41) | GSTP1 | |
| SCHEMBL9813172 | 0.72 | TSHR (0.38) | TSHRALDH1A1POLBAPEX1HTT | |
| SCHEMBL8733252 | 0.71 | SMN1; SMN2 (0.31) | ALDH1A1HTTKMT2AATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| CN-101116036-B | Positive photoresist composition | SAMYANGEMS CO LTD | 2011-02-02 | — | — | CN | disclosed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | disclosed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | disclosed |
| CN-101116036-A | Positive photoresist composition | SAMYANGEMS CO LTD (KR) | 2008-01-30 | — | — | CN | disclosed |
| CN-1781057-A | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2006-05-31 | — | — | CN | disclosed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | disclosed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | disclosed |
| US-5157072-A | For curing unsaturated polyesters and vinyl esters; fillers, phenol-formaldehyde resins, additives | HILTI AKTIENGESELLSCHAFT (LI) | 1992-10-20 | — | — | US | disclosed |