SCHEMBL8733495

SCHEMBL8733495

CNc1cc(NC)cc(S(=O)(=O)O)c1.[NaH]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
HSD17B10 Q99714 2/20 0.43
TP53 P04637 1/20 0.43
CYP3A4 P08684 1/20 0.43
THRB P10828 1/20 0.43
HPGD P15428 1/20 0.43
ALOX15 P16050 1/20 0.43
CASP1 P29466 1/20 0.43
RECQL P46063 1/20 0.43
HIF1A Q16665 1/20 0.43
HTR6 P50406 2/20 0.43
LCK P06239 1/20 0.40
FYN P06241 1/20 0.40
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
ING2 Q9H160 1/20 0.39
SNCA P37840 2/20 0.37
NT5E P21589 4/20 0.36
TSHR P16473 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8736327 0.95 ALDH1A1 (0.43) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL12110006 0.93 ALDH1A1 (0.45) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL176757 0.77 TSHR (0.52) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL35747 0.74 ALDH1A1 (0.61) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL9175160 0.74 ALDH1A1 (0.61) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL5409243 0.74 LCK (0.41) ALDH1A1HSD17B10HTR6LCKFYN
SCHEMBL124133 0.74 LCK (0.55) ALDH1A1HSD17B10HPGDLCKFYN
SCHEMBL5013229 0.74 LCK (0.55) ALDH1A1HSD17B10HPGDLCKFYN
SCHEMBL9776549 0.72 NT5E (0.53) ALDH1A1HSD17B10TP53CYP3A4THRB
SCHEMBL11149987 0.72 PRMT1 (0.49) ALDH1A1HSD17B10TP53CYP3A4THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101565505-B Waterborne bimaleimide resin and preparation method TIANJIN BOYUAN NEW MATERIALS CO LTD 2010-12-29 CN disclosed
CN-101565505-A Waterborne bimaleimide resin and preparation method TIANJIN BOYUAN NEW MATERIALS C (CN) 2009-10-28 CN disclosed
EP-0470636-B1 A photosensitive resin composition TOYO BOSEKI (JP) 1998-11-18 EP disclosed
US-5204223-A Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor TOYO BOSEKI KABUSHIKI KAISHA (JP) 1993-04-20 US disclosed
EP-0470636-A1 A photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1992-02-12 EP disclosed