SCHEMBL8733536

SCHEMBL8733536

NCCCC(CCN)S(=O)(=O)O.[NaH]

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.41
BLM P54132 3/20 0.33
PMP22 Q01453 3/20 0.33
LMNA P02545 3/20 0.33
CPB2 Q96IY4 1/20 0.33
SLC6A6 P31641 1/20 0.33
CYP2C19 P33261 1/20 0.33
GSR P00390 1/20 0.31
CYP3A4 P08684 1/20 0.31
NFKB1 P19838 1/20 0.31
RNPEP Q9H4A4 1/20 0.30
GMNN O75496 1/20 0.30
ALDH1A1 P00352 1/20 0.30
TP53 P04637 1/20 0.30
TSHR P16473 1/20 0.30
MAPK1 P28482 1/20 0.30
THPO P40225 1/20 0.30
HBB P68871 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8734767 0.95 APP (0.41) APPBLMPMP22LMNACPB2
SCHEMBL28586829 0.91 APP (0.41) APPBLMPMP22LMNACPB2
SCHEMBL28914373 0.91 LMNA (0.39) APPBLMLMNASLC6A6CYP2C19
SCHEMBL28592838 0.88 BLM (0.41) APPBLMPMP22LMNASLC6A6
SCHEMBL8105490 0.86 APP (0.36) APPBLMLMNASLC6A6CYP2C19
SCHEMBL3181159 0.84 APP (0.39) APPBLMPMP22LMNACPB2
SCHEMBL19066306 0.84 APP (0.42) APPBLMPMP22LMNACPB2
SCHEMBL28606533 0.82 APP (0.41) APPBLMPMP22LMNACPB2
SCHEMBL4895410 0.81 LMNA (0.36) APPBLMLMNASLC6A6CYP2C19
SCHEMBL7032504 0.80 APP (0.39) APPBLMPMP22LMNACPB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0470636-B1 A photosensitive resin composition TOYO BOSEKI (JP) 1998-11-18 EP disclosed
US-5204223-A Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor TOYO BOSEKI KABUSHIKI KAISHA (JP) 1993-04-20 US disclosed
EP-0470636-A1 A photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1992-02-12 EP disclosed