Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.51 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8736360 | 0.89 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL22656902 | 0.83 | SIGMAR1 (0.48) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL16810232 | 0.82 | SIGMAR1 (0.36) | SIGMAR1 | |
| SCHEMBL24965969 | 0.82 | SIGMAR1 (0.53) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL3100760 | 0.82 | SIGMAR1 (0.53) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL15217044 | 0.82 | SIGMAR1 (0.53) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL14135342 | 0.82 | SIGMAR1 (0.53) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL15080727 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL6250423 | 0.80 | SIGMAR1 (0.51) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL8406252 | 0.79 | SIGMAR1 (0.48) | SIGMAR1CHRM2CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240375396-A1 | PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR FOR RELIEF PRINTING, AND PRINTING PLATE | TOYOBO MC CORPORATION (JP) | 2024-11-14 | — | — | US | disclosed |
| EP-4411479-A1 | PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE | TOYOBO MC Corporation (JP) | 2024-08-07 | — | — | EP | disclosed |
| CN-118076923-A | Printing original plate for photosensitive resin relief printing plate and printing plate | 东洋纺MC株式会社 | 2024-05-24 | — | — | CN | disclosed |
| CN-110997659-B | Process for preparing propylene amine and propylene amine derivatives | 诺力昂化学品国际有限公司 | 2023-09-12 | — | — | CN | disclosed |
| WO-2023054272-A1 | PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE | 東洋紡株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-11390607-B2 | Process to prepare propylene amines and propylene amine derivatives | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2022-07-19 | — | — | US | disclosed |
| US-20200361910-A1 | PROCESS TO PREPARE PROPYLENE AMINES AND PROPYLENE AMINE DERIVATIVES | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2020-11-19 | — | — | US | disclosed |
| EP-3109702-B1 | RESIN LAMINATE AND RELIEF PRINTING ORIGINAL PLATE | TORAY INDUSTRIES (JP) | 2020-06-24 | — | — | EP | disclosed |
| EP-3665168-A1 | PROCESS TO PREPARE PROPYLENE AMINES AND PROPYLENE AMINE DERIVATIVES | Nouryon Chemicals International B.V. (NL) | 2020-06-17 | — | — | EP | disclosed |
| CN-110997659-A | Process for preparing propyleneamine and propyleneamine derivatives | 诺力昂化学品国际有限公司 | 2020-04-10 | — | — | CN | disclosed |
| EP-2960066-A1 | RESIN PRINTING ORIGINAL PLATE FOR LASER ENGRAVING | Toray Industries, Inc. (JP) | 2015-12-30 | — | — | EP | disclosed |
| US-20150367668-A1 | RESIN PRINTING PLATE PRECUSOR FOR LASER ENGRAVING | TORAY INDUSTRIES, INC. (JP) | 2015-12-24 | — | — | US | disclosed |
| US-20150205201-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PRINTING PLATE ORIGINAL | TORAY INDUSTRIES, INC. (JP) | 2015-07-23 | — | — | US | disclosed |
| EP-2881793-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR | Toray Industries, Inc. (JP) | 2015-06-10 | — | — | EP | disclosed |
| EP-0470636-B1 | A photosensitive resin composition | TOYO BOSEKI (JP) | 1998-11-18 | — | — | EP | disclosed |
| US-5204223-A | Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1993-04-20 | — | — | US | disclosed |
| EP-0470636-A1 | A photosensitive resin composition | Toyo Boseki Kabushiki Kaisha (JP) | 1992-02-12 | — | — | EP | disclosed |
| US-4220704-A | Water soluble photosensitive resin compositions comprising a polyamide or its salt | TOYOBO CO., LTD. (JP) | 1980-09-02 | — | — | US | disclosed |
| US-4188221-A | REACTION PRODUCT OF (METH)ACRYLIC ACID AND A POLYGLYCIDYL ETHER OF A POLYOL, MOISTURE RESISTANCE | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1980-02-12 | — | — | US | disclosed |
| US-4145222-A | Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt | TOYOBO CO., LTD. (JP) | 1979-03-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200361910-A1 | PROCESS TO PREPARE PROPYLENE AMINES AND PROPYLENE AMINE DERIVATIVES | HRH3, HRH4, HRH1 | SIGMAR1 288/4885CHRM2 77/4885CHRM1 44/4885 |
| US-11390607-B2 | Process to prepare propylene amines and propylene amine derivatives | HRH3, HRH4, HRH1 | SIGMAR1 325/4885CHRM2 121/4885CHRM1 76/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.