Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.56 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | MCHR1 | Q99705 | 5/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8734834 | 0.89 | SIGMAR1 (0.51) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL15080727 | 0.85 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL3090051 | 0.83 | SIGMAR1 (0.58) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL22656902 | 0.83 | SIGMAR1 (0.48) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL3100817 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL4599654 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL29483945 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL4599655 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1 | |
| SCHEMBL3986067 | 0.81 | SIGMAR1 (0.56) | SIGMAR1CHRM2CHRM1MCHR1 | |
| SCHEMBL3106101 | 0.80 | SIGMAR1 (0.55) | SIGMAR1CHRM2CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4581209-A | N-aminoalkyl alkylpiperazine promoted acid gas scrubbing process | EXXON RESEARCH AND ENGINEERING CO. (US) | 1986-04-08 | — | — | US | claimed |
| US-20240375396-A1 | PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR FOR RELIEF PRINTING, AND PRINTING PLATE | TOYOBO MC CORPORATION (JP) | 2024-11-14 | — | — | US | disclosed |
| EP-4411479-A1 | PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE | TOYOBO MC Corporation (JP) | 2024-08-07 | — | — | EP | disclosed |
| CN-118076923-A | Printing original plate for photosensitive resin relief printing plate and printing plate | 东洋纺MC株式会社 | 2024-05-24 | — | — | CN | disclosed |
| WO-2023054272-A1 | PRINTING ORIGINAL PLATE FOR PHOTOSENSITIVE RESIN LETTERPRESS, AND PRINTING PLATE | 東洋紡株式会社 | 2023-04-06 | — | — | WO | disclosed |
| EP-0470636-B1 | A photosensitive resin composition | TOYO BOSEKI (JP) | 1998-11-18 | — | — | EP | disclosed |
| US-5204223-A | Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1993-04-20 | — | — | US | disclosed |
| EP-0470636-A1 | A photosensitive resin composition | Toyo Boseki Kabushiki Kaisha (JP) | 1992-02-12 | — | — | EP | disclosed |
| US-4581209-A | N-aminoalkyl alkylpiperazine promoted acid gas scrubbing process | EXXON RESEARCH AND ENGINEERING CO. (US) | 1986-04-08 | — | — | US | disclosed |
| US-4581209-A | N-aminoalkyl alkylpiperazine promoted acid gas scrubbing process | EXXON RESEARCH AND ENGINEERING CO. (US) | 1986-04-08 | — | — | US | disclosed |
| EP-0041555-A4 | NOVEL SECONDARY AND TERTIARY AMINES AND THE USE THEREOF IN COMPOSITIONS AND IN STABILIZATION OF POLYMERS AGAINST ULTRAVIOLET LIGHT DEGRADATION. | GOODRICH CO B F (US) | 1982-04-22 | — | — | EP | disclosed |
| EP-0041555-A1 | NOVEL SECONDARY AND TERTIARY AMINES AND THE USE THEREOF IN COMPOSITIONS AND IN STABILIZATION OF POLYMERS AGAINST ULTRAVIOLET LIGHT DEGRADATION | The B.F. GOODRICH Company (US) | 1981-12-16 | — | — | EP | disclosed |
| WO-1981001706-A1 | NOVEL SECONDARY AND TERTIARY AMINES AND THE USE THEREOF IN COMPOSITIONS AND IN STABILIZATION OF POLYMERS AGAINST ULTRAVIOLET LIGHT DEGRADATION | GOODRICH CO B F (US) | 1981-06-25 | — | — | WO | disclosed |
| US-4220704-A | Water soluble photosensitive resin compositions comprising a polyamide or its salt | TOYOBO CO., LTD. (JP) | 1980-09-02 | — | — | US | disclosed |
| US-4145222-A | Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt | TOYOBO CO., LTD. (JP) | 1979-03-20 | — | — | US | disclosed |