SCHEMBL8735006

SCHEMBL8735006

C=C(C)C(=O)NCN1CCN(CNC(=O)C(=C)C)C1=O

nearest known ligand 0.35

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.35
POLB P06746 2/20 0.33
GAA P10253 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
LMNA P02545 1/20 0.31
KMT2A Q03164 2/20 0.31
TGFBR1 P36897 1/20 0.31
MEN1 O00255 1/20 0.31
TP53 P04637 2/20 0.31
KDM4E B2RXH2 2/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7635545 0.80 KMT2A (0.48) POLBKMT2AALDH1A1
SCHEMBL12939001 0.80 KMT2A (0.42) NPSR1POLBLMNAKMT2AMEN1
SCHEMBL8064632 0.77 KMT2A (0.42) POLBGAARECQLBLML3MBTL1
SCHEMBL9162992 0.77 KMT2A (0.36) KMT2A
SCHEMBL10278735 0.74 GAA (0.36) NPSR1POLBGAARECQLBLM
SCHEMBL10278655 0.73 NPSR1 (0.52) NPSR1GAAKMT2AMEN1KDM4E
SCHEMBL7912632 0.72 ALDH1A1 (0.45) POLBLMNAKMT2AMEN1TP53
SCHEMBL7105166 0.72 NPSR1 (0.50) NPSR1POLBGAAL3MBTL1KMT2A
SCHEMBL2197571 0.72 KMT2A (0.35) KMT2AKDM4E
SCHEMBL94348 0.69 GAA (0.33) GAAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0470636-B1 A photosensitive resin composition TOYO BOSEKI (JP) 1998-11-18 EP disclosed
US-5204223-A Soluble synthetic polymer, photopolymerizable unsaturated compound and photopolymerization inhibitor TOYO BOSEKI KABUSHIKI KAISHA (JP) 1993-04-20 US disclosed
EP-0470636-A1 A photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1992-02-12 EP disclosed
US-5043468-A Mixture of n-nitrosophenylhydroxylamine salt with aminocarboxylic acid RHONE-POULENC CHIMIE (FR) 1991-08-27 US disclosed
US-4287111-A CONTAINING A VINYL POLYMER, AN UNSATURATED MONOMER, A POLYMERIZATION CATALYST AND A CROSSLINKING AGENT RHONE-POULENC INDUSTRIES (FR) 1981-09-01 US disclosed
US-4168614-A Method for the consolidation of mining deposits RHONE-POULENC INDUSTRIES (FR) 1979-09-25 US disclosed