Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB4 known ✓ | P30926 | 1/20 | 0.43 |
| ▸ | CHRNA3 known ✓ | P32297 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.91 |
| ▸ | TSHR | P16473 | 1/20 | 0.91 |
| ▸ | THRB | P10828 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL28148367 | 0.95 | ALDH1A1 (0.91) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL8518918 | 0.95 | ALDH1A1 (1.00) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL24056 | 0.95 | — | — | |
| Acetic Acid SCHEMBL1904829 | 0.94 | ALDH1A1 (0.79) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL23495553 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL2702056 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| Ether SCHEMBL6548099 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL57013 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| Methyl Alcohol SCHEMBL3844218 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL11421454 | 0.93 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBLMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105555840-B | Resin particle group and method for producing same | 积水化成品工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-109791813-A | Electroconductive resin particle and its purposes | 积水化成品工业株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-105555840-A | Resin particle group and method for producing same | SEKISUI PLASTICS | 2016-05-04 | — | — | CN | disclosed |
| CN-1881090-B | Substrate processing system for performing exposure process in gas atmosphere | NIPPON ELECTRIC CO | 2011-05-25 | — | — | CN | disclosed |
| CN-100514191-C | Substrate processing system for performing exposure process in gas atmosphere | NEC LCD TECHNOLOGIES LTD (JP) | 2009-07-15 | — | — | CN | disclosed |
| CN-100342488-C | Substrate processing system for performing exposure processing in gas atmosphere | NEC LIQUID CRYSTAL TECHNOLOGY (JP) | 2007-10-10 | — | — | CN | disclosed |
| CN-100334507-C | Substrate processing system for performing exposure process in gas atmosphere | NEC LIQUID CRYSTAL TECHNOLOGY (JP) | 2007-08-29 | — | — | CN | disclosed |
| CN-1311302-C | Substrate processing system for performing exposure process in gas atmosphere | NIPPON ELECTRIC CO (JP) | 2007-04-18 | — | — | CN | disclosed |
| CN-1881089-A | Substrate processing system for performing exposure process in gas atmosphere | NEC LCD TECHNOLOGIES CO LTD (JP) | 2006-12-20 | — | — | CN | disclosed |
| CN-1881090-A | Substrate processing system for performing exposure process in gas atmosphere | NEC LCD TECHNOLOGIES CO LTD (JP) | 2006-12-20 | — | — | CN | disclosed |
| CN-1194390-C | Substrate processing system for performing exposure processing in gas atmosphere | NEC LIQUID CRGSTAL TECH CO LTD (JP) | 2005-03-23 | — | — | CN | disclosed |
| CN-1558293-A | Substrate processing system for performing exposure process in gas atmosphere | NECҺ��������ʽ���� | 2004-12-29 | — | — | CN | disclosed |
| CN-1554989-A | Substrate processing system for performing exposure process in gas atmosphere | NECҺ��������ʽ���� | 2004-12-15 | — | — | CN | disclosed |
| CN-1555084-A | Substrate processing system for performing exposure process in gas atmosphere | NECҺ��������ʽ���� | 2004-12-15 | — | — | CN | disclosed |
| CN-1555083-A | Substrate processing system for performing exposure processing in gas atmosphere | NECҺ��������ʽ���� | 2004-12-15 | — | — | CN | disclosed |
| CN-1555085-A | Substrate processing system for performing exposure process in gas atmosphere | NECҺ��������ʽ���� | 2004-12-15 | — | — | CN | disclosed |
| CN-1402308-A | Substrate processing system for performing exposure processing in gas atmosphere | NEC CORP (JP) | 2003-03-12 | — | — | CN | disclosed |
| EP-0640658-B1 | Silicone antifoam composition | DOW CORNING TORAY SILICONE (JP) | 1998-12-30 | — | — | EP | disclosed |
| EP-0640658-A2 | Silicone antifoam composition | Dow Corning Toray Silicone Company, Limited (JP) | 1995-03-01 | — | — | EP | disclosed |
| US-4066628-A | REACTING ORGANIC ISOCYANATE WITH AN EPOXIDE | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) | 1978-01-03 | — | — | US | disclosed |