⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4600041 | 0.80 | — | — | |
| SCHEMBL13326279 | 0.80 | — | — | |
| SCHEMBL13430797 | 0.75 | MMP8 (0.32) | — | |
| SCHEMBL11660569 | 0.71 | — | — | |
| SCHEMBL840716 | 0.70 | — | — | |
| SCHEMBL14400169 | 0.69 | — | — | |
| SCHEMBL14500930 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL13818440 | 0.69 | ALDH1A1 (0.45) | — | |
| SCHEMBL4985120 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL9801977 | 0.67 | ALDH1A1 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9809721-B2 | Aqueous ink, ink cartridge, and ink jet recording method | CANON KABUSHIKI KAISHA (JP) | 2017-11-07 | — | — | US | disclosed |
| US-8353983-B2 | Shrinkage reducing agent | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) | 2013-01-15 | — | — | US | disclosed |
| US-20120266782-A9 | Shrinking Reducing Agent | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) | 2012-10-25 | — | — | US | disclosed |
| US-20120125236-A1 | Shrinking Reducing Agent | CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) | 2012-05-24 | — | — | US | disclosed |
| US-20100062962-A1 | MAINTENANCE LIQUID FOR INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION | 2010-03-11 | — | — | US | disclosed |
| US-20090302266-A1 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING | JSR CORPORATION (JP) | 2009-12-10 | — | — | US | disclosed |
| US-7597436-B2 | Maintenance liquid for ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7540910-B2 | Ink composition, ink set and recording method | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | disclosed |
| US-20070070159-A1 | Ink composition, ink set and recording method | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |