⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11325704 | 0.77 | — | — | |
| SCHEMBL724460 | 0.73 | — | — | |
| SCHEMBL17805177 | 0.73 | LMNA (0.32) | — | |
| SCHEMBL452751 | 0.69 | MEN1 (0.31) | — | |
| SCHEMBL231599 | 0.69 | — | — | |
| SCHEMBL4215260 | 0.69 | — | — | |
| SCHEMBL4217688 | 0.69 | — | — | |
| SCHEMBL4537416 | 0.66 | — | — | |
| SCHEMBL35289 | 0.58 | — | — | |
| SCHEMBL2103891 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240170282-A1 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | ASM IP HOLDING B.V. (NL) | 2024-05-23 | — | — | US | claimed |
| CN-117995660-A | Method and system for adjusting properties of photoresist adhesion layer | ASM IP私人控股有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-116949433-A | Method and system for forming silicon oxycarbide layer and structure formed using the same | ASM IP私人控股有限公司 | 2023-10-27 | — | — | CN | claimed |
| US-20230340663-A1 | PLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAMEPLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAME | ASM IP HOLDING B.V. (NL) | 2023-10-26 | — | — | US | claimed |
| US-20240170282-A1 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | ASM IP HOLDING B.V. (NL) | 2024-05-23 | — | — | US | disclosed |
| CN-116949433-A | Method and system for forming silicon oxycarbide layer and structure formed using the same | ASM IP私人控股有限公司 | 2023-10-27 | — | — | CN | disclosed |
| US-20230340663-A1 | PLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAMEPLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAME | ASM IP HOLDING B.V. (NL) | 2023-10-26 | — | — | US | disclosed |
| US-20230340663-A1 | PLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAMEPLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAME | ASM IP HOLDING B.V. (NL) | 2023-10-26 | — | — | US | disclosed |
| US-5612438-A | Curable siloxane polymers containing integral UV absorbers | GENERAL ELECTRIC COMPANY (US) | 1997-03-18 | — | — | US | disclosed |
| EP-0598545-A2 | Curable siloxane polymers | GENERAL ELECTRIC COMPANY (US) | 1994-05-25 | — | — | EP | disclosed |
| US-5310845-A | Adding an amine catalyst to a solution of cosolvent-diluted silyated UV agent and polysiloxane/solvent mixture | GENERAL ELECTRIC COMPANY (US) | 1994-05-10 | — | — | US | disclosed |
| US-4483973-A | Adhesion promoters for one-component RTV silicone compositions | GENERAL ELECTRIC COMPANY (US) | 1984-11-20 | — | — | US | disclosed |
| US-4304805-A | Sealing leaks by polymerization of volatilized aminosilane monomers | Packo, Joseph J. (US) | 1981-12-08 | — | — | US | disclosed |