⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2099907 | 0.79 | — | — | |
| SCHEMBL2100103 | 0.79 | — | — | |
| SCHEMBL2058729 | 0.70 | — | — | |
| SCHEMBL20377925 | 0.70 | — | — | |
| SCHEMBL2100322 | 0.69 | — | — | |
| SCHEMBL20499830 | 0.69 | — | — | |
| SCHEMBL2103247 | 0.67 | — | — | |
| SCHEMBL972471 | 0.67 | — | — | |
| SCHEMBL510702 | 0.67 | — | — | |
| SCHEMBL2101366 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 225 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| CN-113680338-B | Novel chromatographic material and preparation method thereof | 天津博蕴纯化装备材料科技有限公司 | 2024-06-04 | — | — | CN | claimed |
| EP-4358119-A2 | IMPROVED SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE | Applied Materials, Inc. (US) | 2024-04-24 | — | — | EP | claimed |
| CN-117334560-A | Improved self-assembled monolayer blocking with intermittent air-water exposure | 应用材料公司 | 2024-01-02 | — | — | CN | claimed |
| CN-109075021-B | Improved self-assembled monolayer blocking with intermittent air-water exposure | 应用材料公司 | 2023-09-05 | — | — | CN | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | claimed |
| CN-110573651-B | Formulations for depositing silicon doped hafnium oxide as ferroelectric material | 弗萨姆材料美国有限责任公司 | 2022-07-22 | — | — | CN | claimed |
| US-20220189767-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2022-06-16 | — | — | US | claimed |
| WO-2018170126-A1 | NEW FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-20170256402-A1 | SELF-ASSEMBLED MONOLAYER BLOCKING WITH INTERMITTENT AIR-WATER EXPOSURE | APPLIED MATERIALS, INC. | 2017-09-07 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-0671483-B1 | Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM SPA (IT) | 1997-12-29 | — | — | EP | claimed |
| EP-0671483-A1 | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM S.p.A. (IT) | 1995-09-13 | — | — | EP | claimed |
| US-5424095-A | Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking | ENIRICERCHE S.P.A. (IT) | 1995-06-13 | — | — | US | claimed |
| EP-0189839-B1 | PROCESS FOR PREPARING TRIACETOXYSILANES FORM TRIS(AMINO)SILANES | UNION CARBIDE CORPORATION (US) | 1989-03-15 | — | — | EP | claimed |
| EP-0189839-A1 | Process for preparing triacetoxysilanes form tris(amino)silanes | UNION CARBIDE CORPORATION (US) | 1986-08-06 | — | — | EP | claimed |
| US-4556725-A | Process for preparing triacetoxysilanes from tris(amino)silanes | UNION CARBIDE CORPORATION (US) | 1985-12-03 | — | — | US | claimed |