SCHEMBL8744643

SCHEMBL8744643

CC(C)=C(C)c1ccc(O)cc1

nearest known ligand 0.78

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.67
ESR2 Q92731 6/20 0.67
CYP19A1 P11511 1/20 0.54
HSD17B1 P14061 1/20 0.48
MAPT P10636 5/20 0.48
LMNA P02545 5/20 0.48
HSD17B10 Q99714 4/20 0.48
MEN1 O00255 4/20 0.48
KMT2A Q03164 4/20 0.48
CYP3A4 P08684 3/20 0.48
ALOX15 P16050 3/20 0.48
HIF1A Q16665 3/20 0.48
NR3C1 P04150 2/20 0.48
TP53 P04637 2/20 0.48
CYP1A2 P05177 2/20 0.48
ADORA3 P0DMS8 2/20 0.48
CYP2D6 P10635 2/20 0.48
CYP2C9 P11712 2/20 0.48
CYP2C19 P33261 2/20 0.48
OPRD1 P41143 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dimethylstilbestrol SCHEMBL125634 0.88 ESR1 (0.74) ESR1ESR2CYP19A1HSD17B1MAPT
Dimethylstilbestrol SCHEMBL125635 0.88 ESR1 (0.74) ESR1ESR2CYP19A1HSD17B1MAPT
Dimethylstilbestrol SCHEMBL13339102 0.88 ESR1 (0.74) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL15999197 0.78 ACHE (0.68) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL2768215 0.77 ALDH1A1 (0.50) ESR1ESR2MAPTLMNAMEN1
SCHEMBL122169 0.77 ESR1 (0.67) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL19056761 0.76 ESR1 (0.58) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL19056760 0.76 ESR1 (0.58) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL1071921 0.75 ESR1 (0.57) ESR1ESR2CYP19A1HSD17B1MAPT
SCHEMBL3656765 0.75 ESR1 (0.57) ESR1ESR2CYP19A1HSD17B1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4147830-A Recording sheet FUJI PHOTO FILM CO., LTD. (JP) 1979-04-03 US claimed
EP-0662990-B1 NOVOLAK RESIN MIXTURES HOECHST CELANESE CORP (US) 1997-10-29 EP disclosed
EP-0662222-B1 POSITIVE-WORKING PHOTORESIST COMPOSITION HOECHST CELANESE CORP (US) 1997-01-22 EP disclosed
EP-0662990-A1 NOVOLAK RESIN MIXTURES. HOECHST CELANESE CORP (US) 1995-07-19 EP disclosed
EP-0662222-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION. HOECHST CELANESE CORP (US) 1995-07-12 EP disclosed
US-5371169-A Blends with overlapping molecular weight distribution; used in positive photoresists HOECHST CELANESE CORPORATION (US) 1994-12-06 US disclosed
WO-1994007955-A1 NOVOLAK RESIN MIXTURES HOECHST CELANESE CORPORATION (US) 1994-04-14 WO disclosed
WO-1994008275-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION HOECHST CELANESE CORPORATION (US) 1994-04-14 WO disclosed
US-4147830-A Recording sheet FUJI PHOTO FILM CO., LTD. (JP) 1979-04-03 US disclosed
US-4076887-A Recording sheets FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US disclosed