SCHEMBL874660

SCHEMBL874660

CO[CH]C(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.54
MAPK1 P28482 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
AKT1 P31749 3/20 0.53
TSHR P16473 1/20 0.52
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
NFE2L2 Q16236 1/20 0.50
BCHE P06276 4/20 0.49
MAPT P10636 4/20 0.49
LMNA P02545 3/20 0.49
NPC1 O15118 3/20 0.49
RAB9A P51151 3/20 0.49
CYP3A4 P08684 2/20 0.49
NFKB1 P19838 1/20 0.49
NFKB2 Q00653 1/20 0.49
RELA Q04206 1/20 0.49
RECQL P46063 2/20 0.48
TNFRSF1A P19438 2/20 0.47
MAOB P27338 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1875162 0.78 AKT1 (0.59) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL11882381 0.78 AKT1 (0.59) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL11505486 0.78 ALDH1A1 (0.50) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL7529869 0.78 AKT1 (0.59) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL5852785 0.77 MAPT (0.51) ALDH1A1MAPK1TDP1AKT1MEN1
SCHEMBL10544461 0.74 TSHR (0.54) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL11505030 0.74 ELANE (0.49) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL27342596 0.74 LMNA (0.55) ALDH1A1MAPK1TDP1AKT1MEN1
SCHEMBL6262754 0.73 ALDH1A1 (0.61) ALDH1A1MAPK1TDP1AKT1TSHR
SCHEMBL1679834 0.73 ALDH1A1 (0.61) ALDH1A1MAPK1TDP1AKT1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 498 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110806677-A Photoresist composition, pattern forming method and application thereof 常州强力先端电子材料有限公司 2020-02-18 CN claimed
CN-108299401-A A kind of 3- benzyls substituted cumarin-imidazole salt compound and preparation method thereof 红河学院 2018-07-20 CN claimed
US-6096836-A OXYGEN CONTAINING AROMATIC CATALYST AND ALUMINUM COMPOUND KABUSHIKI KAISHA TOSHIBA (JP) 2000-08-01 US claimed
US-5482816-A RESISTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-01-09 US claimed
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US claimed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP claimed
EP-0143711-B1 DERIVATIVES OF N-(METHOXYPHENACYL)AMINE, THEIR THERAPEUTICAL USE AND PROCESS FOR THEIR PREPARATION LABORATOIRE L. LAFON Société anonyme dite: (FR) 1987-08-12 EP claimed
EP-0143711-A2 Derivatives of N-(methoxyphenacyl)amine, their therapeutical use and process for their preparation LABORATOIRE L. LAFON Société anonyme dite: (FR) 1985-06-05 EP claimed
US-4361514-A Carbon analogs of penicillin MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 1982-11-30 US claimed
US-4282149-A Carbon and oxygen analogs of penicillin MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 1981-08-04 US claimed
US-4143046-A CARBON AND OXYGEN ANALOGS OF PENICILLIN MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 1979-03-06 US claimed
CN-114516863-B Imide sulfonate photoacid generator with high acid yield, composition and application 常州强力电子新材料股份有限公司 2024-06-21 CN disclosed
CN-115368285-B oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-26 CN disclosed
CN-115368286-B Oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-22 CN disclosed
CN-115368287-B I-line oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-19 CN disclosed
US-4988662-A MULTILAYER ELEMENT OF A COATED SUBSTRATE, A FILM WITH A COLOR-FORMING LACTONE, AN ACID AND A SENSITIZER DAINIPPON INK AND CHEMICALS, INC. (JP) 1991-01-29 US disclosed
EP-0306924-A1 Process for preparing penicillanic acid derivatives Otsuka Kagaku Kabushiki Kaisha (JP) 1989-03-15 EP disclosed
EP-0143711-B1 DERIVATIVES OF N-(METHOXYPHENACYL)AMINE, THEIR THERAPEUTICAL USE AND PROCESS FOR THEIR PREPARATION LABORATOIRE L. LAFON Société anonyme dite: (FR) 1987-08-12 EP disclosed
CN-86102906-A Preparation 1, the method for the two substituted imidazole  salt of 3- 1987-02-11 CN disclosed
EP-0143711-A2 Derivatives of N-(methoxyphenacyl)amine, their therapeutical use and process for their preparation LABORATOIRE L. LAFON Société anonyme dite: (FR) 1985-06-05 EP disclosed