SCHEMBL8746646

SCHEMBL8746646

Cc1ccc(N(c2ccc(C)cc2)c2ccc(-c3ccccc3C=Cc3ccccc3)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 4/20 0.45
RELA Q04206 1/20 0.42
FGF23 Q9GZV9 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
HPGD P15428 1/20 0.41
NPC1 O15118 1/20 0.40
CYP1A2 P05177 1/20 0.40
MAPT P10636 1/20 0.40
CYP2C19 P33261 1/20 0.40
RAB9A P51151 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
APP P05067 2/20 0.40
TRPA1 O75762 2/20 0.39
NR1H3 Q13133 1/20 0.38
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8746641 1.00 NFE2L2 (0.45) NFE2L2RELAFGF23SMN1; SMN2HPGD
SCHEMBL873003 0.94 NFE2L2 (0.49) NFE2L2RELAFGF23SMN1; SMN2HPGD
SCHEMBL2285299 0.94 NFE2L2 (0.49) NFE2L2RELAFGF23SMN1; SMN2HPGD
SCHEMBL27904806 0.91 APP (0.43) NFE2L2RELACYP1A2MAPTCYP2C19
SCHEMBL1464416 0.87 NFE2L2 (0.54) NFE2L2RELAFGF23SMN1; SMN2NPC1
SCHEMBL7165245 0.87 APP (0.47) NFE2L2RELACYP1A2MAPTCYP2C19
SCHEMBL11574959 0.85 NFE2L2 (0.56) NFE2L2RELAFGF23HPGDMAPT
SCHEMBL8746645 0.85 PELI1 (0.44) NFE2L2RELAFGF23SMN1; SMN2HPGD
SCHEMBL10426423 0.85 RELA (0.40) NFE2L2RELAFGF23SMN1; SMN2HPGD
SCHEMBL15988071 0.84 APP (0.47) NFE2L2RELACYP1A2MAPTCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0506387-B1 Electrophotographic organic photosensitive material MITA INDUSTRIAL CO LTD (JP) 1997-02-26 EP disclosed
US-5324610-A Improved sensitivity, residual potential MITA INDUSTRIAL CO., LTD. (JP) 1994-06-28 US disclosed
EP-0506387-A2 Electrophotographic organic photosensitive material MITA INDUSTRIAL CO., LTD. (JP) 1992-09-30 EP disclosed