Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.32 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5888370 | 0.94 | ESR1 (0.47) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL28846222 | 0.86 | ALDH1A1 (0.50) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL15807759 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL10626255 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL9509524 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL9715846 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL10523793 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL619307 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL28846186 | 0.83 | ALDH1A1 (0.46) | ESR1ALDH1A1TSHRHDAC8MAPT | |
| SCHEMBL7632936 | 0.81 | ALDH1A1 (0.55) | ESR1ALDH1A1TSHRHDAC8MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119661782-A | PVDF material with dispersed anti-gel function for positive electrode slurry and preparation method thereof | 郑州大学 | 2025-03-21 | — | — | CN | claimed |
| CN-118388726-A | Solution polymerized styrene butadiene rubber containing N/O/Si functional monomer and preparation method thereof | 湖南理工学院 | 2024-07-26 | — | — | CN | claimed |
| CN-117264476-A | PTFE non-stick coating | 慈溪市中一涂料有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-116693782-A | Thermoplastic elastomer containing O/N/Si functional monomer and preparation method thereof | 湖南理工学院 | 2023-09-05 | — | — | CN | claimed |
| EP-0505997-B1 | Process for producing styrenic polymer and copolymer | IDEMITSU KOSAN CO (JP) | 1997-05-28 | — | — | EP | claimed |
| US-5378777-A | Styrene monomer substituted with silicon group, transition metal complex catalyst | IDEMITSU KOSAN CO., LTD. (JP) | 1995-01-03 | — | — | US | claimed |
| EP-0330209-B1 | PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST | BASF Aktiengesellschaft (DE) | 1993-07-21 | — | — | EP | claimed |
| EP-0505997-A2 | Process for producing styrenic polymer and copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | claimed |
| EP-0330209-A2 | Photoreactive polymers and process for the production of a two-layer resist | BASF Aktiengesellschaft (DE) | 1989-08-30 | — | — | EP | claimed |
| JP-62209116-A | — | — | None | — | — | JP | disclosed |
| CN-119661782-B | PVDF material with dispersed anti-gel function for positive electrode slurry and preparation method thereof | 郑州大学 | 2025-12-30 | — | — | CN | disclosed |
| CN-119661782-A | PVDF material with dispersed anti-gel function for positive electrode slurry and preparation method thereof | 郑州大学 | 2025-03-21 | — | — | CN | disclosed |
| CN-119661782-A | PVDF material with dispersed anti-gel function for positive electrode slurry and preparation method thereof | 郑州大学 | 2025-03-21 | — | — | CN | disclosed |
| CN-118388726-A | Solution polymerized styrene butadiene rubber containing N/O/Si functional monomer and preparation method thereof | 湖南理工学院 | 2024-07-26 | — | — | CN | disclosed |
| EP-0505997-B1 | Process for producing styrenic polymer and copolymer | IDEMITSU KOSAN CO (JP) | 1997-05-28 | — | — | EP | disclosed |
| US-5378777-A | Styrene monomer substituted with silicon group, transition metal complex catalyst | IDEMITSU KOSAN CO., LTD. (JP) | 1995-01-03 | — | — | US | disclosed |
| EP-0330209-B1 | PHOTOREACTIVE POLYMERS AND PROCESS FOR THE PRODUCTION OF A TWO-LAYER RESIST | BASF Aktiengesellschaft (DE) | 1993-07-21 | — | — | EP | disclosed |
| EP-0505997-A2 | Process for producing styrenic polymer and copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| EP-0330209-A2 | Photoreactive polymers and process for the production of a two-layer resist | BASF Aktiengesellschaft (DE) | 1989-08-30 | — | — | EP | disclosed |
| JP-S62209116-A | NOVEL COPOLYMER | ASAHI CHEM IND CO LTD | 1987-09-14 | — | — | JP | disclosed |