Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.68 |
| ▸ | MAPT | P10636 | 3/20 | 0.63 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.59 |
| ▸ | DGKA | P23743 | 1/20 | 0.55 |
| ▸ | PRKCA | P17252 | 1/20 | 0.54 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.54 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.54 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.50 |
| ▸ | PAM | P19021 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | GMNN | O75496 | 1/20 | 0.50 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.50 |
| ▸ | BLM | P54132 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8346746 | 1.00 | LMNA (0.68) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL28289715 | 1.00 | LMNA (0.68) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL27909979 | 0.89 | PRKCA (0.61) | LMNAMAPTALDH1A1DGKAPRKCA | |
| SCHEMBL15270660 | 0.89 | LMNA (0.50) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL15271162 | 0.89 | LMNA (0.50) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL15270500 | 0.89 | LMNA (0.50) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL15270812 | 0.87 | LMNA (0.46) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL10714635 | 0.86 | LMNA (0.71) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL9446900 | 0.86 | LMNA (0.71) | LMNAMAPTMAPK1ALDH1A1DGKA | |
| SCHEMBL31112584 | 0.86 | LMNA (0.71) | LMNAMAPTMAPK1ALDH1A1DGKA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111848685-B | Preparation method of amphiphilic PN = PS type phosphorus-containing tree crown macromolecule nano micelle and application of drug carrier of amphiphilic PN = PS type phosphorus-containing tree crown macromolecule nano micelle | 东华大学 | 2021-08-31 | — | — | CN | disclosed |
| CN-111848685-A | Preparation method of amphiphilic PN = PS type phosphorus-containing tree crown macromolecule nano micelle and application of drug carrier of amphiphilic PN = PS type phosphorus-containing tree crown macromolecule nano micelle | 东华大学 | 2020-10-30 | — | — | CN | disclosed |
| EP-0492590-B1 | Photopolymerizable composition and dry PS plate | FUJI PHOTO FILM CO LTD (JP) | 1997-09-10 | — | — | EP | disclosed |
| US-5603926-A | CONTAINS A (METH)ACRYLIC MONOMER HAVING AN AMINO GROUP | OSAKA YUKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-02-18 | — | — | US | disclosed |
| US-5334486-A | Reaction product of glycidyl methacrylate and a polyamine; photopolymerization initiator | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-02 | — | — | US | disclosed |
| WO-1992020736-A1 | POLYMER BASED SELFLUBRICATING COMPOSITE | SHIAO SHIN JEN (CN) | 1992-11-26 | — | — | WO | disclosed |
| EP-0492590-A1 | Photopolymerizable composition and dry PS plate | Fuji Photo Film Co., Ltd. (JP) | 1992-07-01 | — | — | EP | disclosed |
| CN-1036976-A | Radiation curing printing ink and coating composition that wherein contained initiator is an ionic dye compounds | MEAD CORP (US) | 1989-11-08 | — | — | CN | disclosed |
| EP-0301769-A2 | Radiation-curable compositions and their use for printing and coating | THE MEAD CORPORATION (US) | 1989-02-01 | — | — | EP | disclosed |
| US-4751102-A | FOR PHOTOHARDENABLE FREE RADICAL ADDITION POLYMERIZABLE OR CROSSLINKABLE COMPOUND | THE MEAD CORPORATION (US) | 1988-06-14 | — | — | US | disclosed |
| US-4037021-A | Photopolymerizable compositions containing a keto dioxolane as the photosensitizer | SUN CHEMICAL CORPORATION (US) | 1977-07-19 | — | — | US | disclosed |
| US-4028204-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a resin and a polycarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |
| US-4022674-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a monomeric ester and a polycarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-05-10 | — | — | US | disclosed |
| US-4008138-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a monocarboxy-substituted benzophenone with a resin | SUN CHEMICAL CORPORATION (US) | 1977-02-15 | — | — | US | disclosed |
| US-4004998-A | Photopolymerizable compounds and compositions comprising the product of the reaction of a hydroxy-containing ester and a monocarboxy-substituted benzophenone | SUN CHEMICAL CORPORATION (US) | 1977-01-25 | — | — | US | disclosed |
| US-3992363-A | POLY(TRICHLOROACETYL-STYRENE) | SUN CHEMICAL CORPORATION (US) | 1976-11-16 | — | — | US | disclosed |
| US-3978133-A | UNSATURATED MONOMERS, POLYHALOACETYL | SUN CHEMICAL CORPORATION (US) | 1976-08-31 | — | — | US | disclosed |
| US-3966573-A | HALOGENATED HYDROCARBONS, CARBONYL COMPOUNDS, ORGANO-NITROGEN, PHOSPHOROUS, ARSENIC, BISMUTH, OR ANTIMONY COMPOUNDS | SUN CHEMICAL CORPORATION (US) | 1976-06-29 | — | — | US | disclosed |
| US-3944509-A | UNSATURATED, PHOTOPOLYMERIZABLE MONOMERS | SUN CHEMICAL CORPORATION (US) | 1976-03-16 | — | — | US | disclosed |
| US-3933682-A | Photopolymerization co-initiator systems | SUN CHEMICAL CORPORATION (US) | 1976-01-20 | — | — | US | disclosed |