SCHEMBL8770700

SCHEMBL8770700

FC(F)(F)c1ccccc1-n1c(-c2nc(-c3ccccc3)c(-c3ccccc3)[nH]2)nc(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK13 O15264 5/20 0.47
MAPK12 P53778 5/20 0.47
MAPK11 Q15759 5/20 0.47
MAPK14 Q16539 5/20 0.47
RAF1 P04049 4/20 0.47
MGAM O43451 3/20 0.47
GAA P10253 2/20 0.47
SI P14410 2/20 0.47
MGAM2 Q2M2H8 2/20 0.47
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 1/20 0.43
MEN1 O00255 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
MAPT P10636 1/20 0.43
CYP2C9 P11712 1/20 0.43
HPGD P15428 1/20 0.43
CYP2C19 P33261 1/20 0.43
PPARG P37231 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27925495 0.86 MGAM (0.47) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL4652915 0.84 KDM4E (0.49) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL3157227 0.83 MAPK13 (0.50) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL4632626 0.83 MAPK13 (0.45) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL27944794 0.82 KDM4E (0.44) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL10385875 0.80 NOX1 (0.52) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL14991080 0.80 MGAM (0.46) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL14991076 0.78 ALDH1A1 (0.47) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL4652725 0.77 MGAM (0.47) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL14991428 0.76 MGAM (0.46) MAPK13MAPK12MAPK11MAPK14RAF1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520364-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1997-09-17 EP claimed
CN-101142525-A Pattern formation material, pattern formation device, and pattern formation method FUJI FILM CORP (JP) 2008-03-12 CN disclosed