Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 7/20 | 0.45 |
| ▸ | MAPK12 | P53778 | 7/20 | 0.45 |
| ▸ | MAPK11 | Q15759 | 7/20 | 0.45 |
| ▸ | MAPK14 | Q16539 | 7/20 | 0.45 |
| ▸ | RAF1 | P04049 | 5/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | PPARG | P37231 | 1/20 | 0.45 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.45 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.45 |
| ▸ | MAPK9 | P45984 | 1/20 | 0.45 |
| ▸ | GCGR | P47871 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14991080 | 0.92 | MGAM (0.46) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL14648010 | 0.91 | MAPK13 (0.52) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL4652725 | 0.88 | MGAM (0.47) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL14991428 | 0.88 | MGAM (0.46) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL4652915 | 0.86 | KDM4E (0.49) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL27925495 | 0.86 | MGAM (0.47) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL3157227 | 0.85 | MAPK13 (0.50) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL27944794 | 0.84 | KDM4E (0.44) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL8770700 | 0.83 | MAPK13 (0.47) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL8663665 | 0.82 | ALOX5 (0.52) | MAPK13MAPK12MAPK11MAPK14RAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118169965-A | Dry film negative photoresist and preparation method thereof | 湖南初源新材料股份有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-117276497-A | Asphalt-based coated resin-based hard carbon composite material and preparation method and application thereof | 常州烯源谷新材料科技有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-116218033-A | Application of organic material in preparing color-changeable polymer material | 四川大学 | 2023-06-06 | — | — | CN | claimed |
| CN-114716628-B | LDI photosensitive dry film and preparation method thereof | 广东诚展科技股份有限公司 | 2022-09-20 | — | — | CN | claimed |
| CN-114716628-A | LDI photosensitive dry film and preparation method thereof | 河源诚展科技有限公司 | 2022-07-08 | — | — | CN | claimed |
| US-4894314-A | FOR POLYMERIZATION BY EXPOSURE TO VISIBLE LASER LIGHT | MORTON THIOKOL, INC. (US) | 1990-01-16 | — | — | US | claimed |
| CN-118289737-A | Heteroatom doped porous hard carbon anode material and preparation method and application thereof | 中国科学院上海硅酸盐研究所 | 2024-07-05 | — | — | CN | disclosed |
| CN-118169965-A | Dry film negative photoresist and preparation method thereof | 湖南初源新材料股份有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-118112889-A | Photosensitive resist composition and dry film resist | 杭州福斯特电子材料有限公司 | 2024-05-31 | — | — | CN | disclosed |
| CN-115895313-B | Resin composition and cured film | 新应材股份有限公司 | 2024-05-10 | — | — | CN | disclosed |
| CN-117276497-A | Asphalt-based coated resin-based hard carbon composite material and preparation method and application thereof | 常州烯源谷新材料科技有限公司 | 2023-12-22 | — | — | CN | disclosed |
| CN-116879278-B | Electrochemiluminescence sensor for detecting dry film dissolving amount and detection method | 太仓斯迪克新材料科技有限公司 | 2023-11-28 | — | — | CN | disclosed |
| CN-116981997-A | Method for manufacturing laminate with conductor pattern | 富士胶片株式会社 | 2023-10-31 | — | — | CN | disclosed |
| EP-1589374-B1 | Polymerizable composition and process for producing lithographic plate using the polymerizable composition | FUJIFILM CORP (JP) | 2008-10-01 | — | — | EP | disclosed |
| EP-1669194-B1 | Lithographic printing plate precursor and method of producing printing plate | FUJIFILM CORP (JP) | 2008-05-28 | — | — | EP | disclosed |
| CN-101142525-A | Pattern formation material, pattern formation device, and pattern formation method | FUJI FILM CORP (JP) | 2008-03-12 | — | — | CN | disclosed |
| US-20060127810-A1 | Lithographic printing plate precursor and method of producing printing plate | FUJI PHOTO FILM CO. LTD. | 2006-06-15 | — | — | US | disclosed |
| EP-1669194-A1 | Lithographic printing plate precursor and method of producing printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-06-14 | — | — | EP | disclosed |
| US-5939238-A | Photoimageable composition having improved photoinitiator system | MORTON INTERNATIONAL, INC. (US) | 1999-08-17 | — | — | US | disclosed |
| EP-0691206-A2 | Ink jet printhead photoresist layer having improved adhesion characteristics | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-01-10 | — | — | EP | disclosed |