⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8773283 | 1.00 | — | — | |
| SCHEMBL5616647 | 0.77 | — | — | |
| SCHEMBL10601784 | 0.74 | — | — | |
| SCHEMBL29154556 | 0.74 | — | — | |
| SCHEMBL7700091 | 0.70 | ALDH1A1 (0.35) | — | |
| SCHEMBL28081641 | 0.70 | — | — | |
| SCHEMBL3293728 | 0.70 | ALDH1A1 (0.35) | — | |
| SCHEMBL133954 | 0.67 | — | — | |
| SCHEMBL1396002 | 0.67 | FFAR3 (0.43) | — | |
| SCHEMBL18814 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0333591-B1 | Process for formation of resist patterns | FUJITSU LTD (JP) | 1997-10-29 | — | — | EP | disclosed |
| US-5194364-A | Polymers from silane substituted acetylenes | FUJITSU LIMITED (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0333591-A2 | Process for formation of resist patterns | FUJITSU LIMITED (JP) | 1989-09-20 | — | — | EP | disclosed |