SCHEMBL8784133

SCHEMBL8784133

Cc1ccc(C(C)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.62
ESR2 Q92731 3/20 0.62
TSHR P16473 2/20 0.55
ACHE P22303 2/20 0.50
LMNA P02545 1/20 0.50
ALOX12 P18054 1/20 0.50
KIF11 P52732 6/20 0.48
ALDH1A1 P00352 2/20 0.44
CYP3A4 P08684 1/20 0.44
MAPK1 P28482 1/20 0.44
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
HPGD P15428 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
TAAR1 Q96RJ0 1/20 0.41
ALOX15 P16050 1/20 0.41
CYP19A1 P11511 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19200980 1.00 ESR1 (0.62) ESR1ESR2TSHRACHELMNA
SCHEMBL12029052 0.93 ESR1 (0.56) ESR1ESR2TSHRACHELMNA
SCHEMBL822977 0.89 ESR1 (0.83) ESR1ESR2TSHRACHELMNA
SCHEMBL20807017 0.89 ACHE (0.54) ESR1ESR2TSHRACHELMNA
SCHEMBL8784428 0.89 TSHR (0.67) ESR1ESR2TSHRACHELMNA
SCHEMBL5887915 0.89 ESR1 (0.75) ESR1ESR2TSHRALDH1A1CYP3A4
SCHEMBL9148067 0.87 ESR1 (0.50) ESR1ESR2TSHRACHELMNA
SCHEMBL15960965 0.87 HPGD (0.65) ESR1ESR2TSHRLMNAALOX12
SCHEMBL430941 0.86 ESR1 (0.70) ESR1ESR2TSHRALDH1A1CYP3A4
SCHEMBL8335012 0.86 ESR1 (0.70) ESR1ESR2TSHRALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2988732-B1 MODIFIED HYDROGELS ASCENDIS PHARMA AS (DK) 2023-05-03 EP disclosed
EP-3054982-B1 HYDROGEL-LINKED IL-1RA PRODRUG ASCENDIS PHARMA AS (DK) 2019-05-01 EP disclosed
EP-0703498-B1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEM CORP (JP) 1997-12-29 EP disclosed
US-5698362-A CONTAINING A TRIARYLMETHANE DERIVATIVE; HIGH RESOLUTION, EXCELLENT IN DEPTH OF FOCUS AND PATTERN PROFILE, STORAGE STABLE MITSUBISHI CHEMICAL CORPORATION (JP) 1997-12-16 US disclosed
EP-0703498-A1 Photosensitive resin composition and method for forming a photoresist pattern MITSUBISHI CHEMICAL CORPORATION (JP) 1996-03-27 EP disclosed