Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 4/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL28845172 | 0.97 | KCNN4 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL14394144 | 0.89 | KCNN4 (0.39) | KCNN4TAAR1MAPK1TSHRCYP2C19 | |
| SCHEMBL11673454 | 0.82 | KCNN4 (0.41) | KCNN4TAAR1MAPK1TSHRTP53 | |
| SCHEMBL4811042 | 0.81 | KCNN4 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL3701035 | 0.81 | KCNN4 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL12834072 | 0.79 | TAAR1 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL879532 | 0.79 | TAAR1 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL14608023 | 0.79 | TAAR1 (0.44) | KCNN4TAAR1MAPK1ALDH1A1TSHR | |
| SCHEMBL11431120 | 0.79 | KIF11 (0.41) | KCNN4TAAR1ESR1ESR2 | |
| SCHEMBL17067295 | 0.77 | ELANE (0.53) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12493243-B2 | Film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-09 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-1787809-A1 | Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate | Fujifilm Corporation (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1783184-A1 | Curable ink composition and oxetane compound | Fujifilm Corporation (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| EP-1770441-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1770133-A1 | Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate | FUJIFILM Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1762599-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate | FUJIFILM Corporation (JP) | 2007-03-14 | — | — | EP | disclosed |
| EP-1757635-A1 | Curable modified oxetane compound and ink composition comprising it | Fuji Photo Film Co., Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-4052463-A | PROCESS FOR PREPARING TERTIARY PHOSPHINE SULFIDES AND OXIDES | STAUFFER CHEMICAL COMPANY (US) | 1977-10-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | KCNN4 1472/4885TAAR1 4473/4885MAPK1 2597/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | KCNN4 893/4885TAAR1 1202/4885MAPK1 4310/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.