SCHEMBL8797779

SCHEMBL8797779

C=COCCOc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.41
KCNA3 P22001 1/20 0.39
PKM P14618 2/20 0.39
PARP10 Q53GL7 1/20 0.37
TAAR1 Q96RJ0 1/20 0.36
ALDH1A1 P00352 1/20 0.36
RECQL P46063 1/20 0.36
LTA4H P09960 4/20 0.36
PLA2G2A P14555 1/20 0.36
RAB9A P51151 2/20 0.35
MAPT P10636 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
KDM4E B2RXH2 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
LMNA P02545 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
NPC1 O15118 1/20 0.34
MAOA P21397 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2569745 1.00 THRB (0.41) THRBKCNA3PKMPARP10TAAR1
SCHEMBL2566568 0.93 THRB (0.35) THRBKCNA3PKMPARP10ALDH1A1
Hydrochloric Acid SCHEMBL2286870 0.91 THRB (0.34) THRBKCNA3PKMALDH1A1MAPT
SCHEMBL13018286 0.90 KCNA3 (0.46) KCNA3LTA4H
SCHEMBL3919025 0.87 CA12 (0.40) THRBPKMPARP10ALDH1A1LTA4H
SCHEMBL10261592 0.86 KCNA3 (0.52) KCNA3PKMPARP10TAAR1ALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL2572043 0.85 THRB (0.35) THRBPKMMEN1KMT2AL3MBTL1
Cyclohexane SCHEMBL2574994 0.85 CA12 (0.39) THRBPKMPARP10RECQLLTA4H
SCHEMBL13337843 0.85 AOC3 (0.33) THRBKCNA3LTA4HPLA2G2ARAB9A
SCHEMBL1127589 0.84 KCNA3 (0.56) THRBKCNA3PKMPARP10TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8703383-B2 Photosensitive copolymer and photoresist composition ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-04-22 US disclosed
US-20120129105-A1 PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
US-7858287-B2 Photosensitive resin, and photosensitive composition HYOGO PREFECTURE (JP) 2010-12-28 US disclosed
US-20090142697-A1 PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI CO., LTD. (JP) 2009-06-04 US disclosed
US-7396960-B2 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2008-07-08 US disclosed
US-20070219368-A1 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2007-09-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070219368-A1 Sulfonium salts C1S, F12, C1R THRB 4221/4885KCNA3 2280/4885PKM 2000/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.