SCHEMBL1127589

SCHEMBL1127589

C=COCCOc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNA3 P22001 1/20 0.56
THRB P10828 1/20 0.55
ALDH1A1 P00352 2/20 0.50
TAAR1 Q96RJ0 1/20 0.50
RECQL P46063 1/20 0.50
PKM P14618 2/20 0.47
HTR1B P28222 2/20 0.45
HDAC3 O15379 1/20 0.45
HDAC4 P56524 1/20 0.45
HDAC1 Q13547 1/20 0.45
HDAC7 Q8WUI4 1/20 0.45
HDAC2 Q92769 1/20 0.45
HDAC10 Q969S8 1/20 0.45
HDAC11 Q96DB2 1/20 0.45
HDAC8 Q9BY41 1/20 0.45
HDAC6 Q9UBN7 1/20 0.45
HDAC9 Q9UKV0 1/20 0.45
HDAC5 Q9UQL6 1/20 0.45
DRD2 P14416 1/20 0.45
DRD4 P21917 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5832620 0.94 THRB (0.50) KCNA3THRBALDH1A1TAAR1RECQL
SCHEMBL683380 0.92 LTA4H (0.56) KCNA3THRBALDH1A1TAAR1RECQL
SCHEMBL2468780 0.89 KCNA3 (0.60) KCNA3THRBALDH1A1TAAR1RECQL
SCHEMBL419937 0.89 THRB (0.41) KCNA3THRBALDH1A1TAAR1RECQL
SCHEMBL416524 0.88 LSS (0.50) KCNA3THRBALDH1A1RECQLHDAC3
SCHEMBL9353618 0.88 KCNA3 (0.64) KCNA3THRBALDH1A1TAAR1RECQL
Maleic Acid SCHEMBL9490054 0.88 THRB (0.57) KCNA3THRBALDH1A1RECQLPKM
SCHEMBL3426128 0.86 MAPK1 (0.43) KCNA3THRBALDH1A1PKMDRD2
SCHEMBL419321 0.85 MAPK1 (0.44) KCNA3THRBALDH1A1KDM4EMEN1
SCHEMBL17549729 0.84 CHRNA7 (0.51) KCNA3THRBALDH1A1TAAR1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 438 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1476509-B1 SELF-POLISHING ANTIFOULING PAINT JOTUN AS (NO) 2007-04-11 EP claimed
EP-0962470-B1 Production process for polyvinyl ether and catalyst used for the process NIPPON CATALYTIC CHEM IND (JP) 2004-03-24 EP claimed
EP-0962470-A1 Production process for polyvinyl ether and catalyst used for the process NIPPON SHOKUBAI CO., LTD. (JP) 1999-12-08 EP claimed
US-4780511-A Method for making polymeric photoactive aryl iodonium salts, products obtained therefrom, and use GENERAL ELECTRIC COMPANY (US) 1988-10-25 US claimed
US-3933509-A Photo-polymerizable composition containing an acid salt of an indolinobenzospiropyran FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US claimed
JP-58059207-A None JP disclosed
JP-1030784-A None JP disclosed
JP-55145712-A None JP disclosed
JP-63306078-A None JP disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
US-12545784-B2 Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device TORAY INDUSTRIES, INC. (JP) 2026-02-10 US disclosed
US-12461444-B2 Sulfonium salt, photoacid generator, curable composition, and resist composition SAN-APRO LTD. (JP) 2025-11-04 US disclosed
JP-S63306078-A DOUBLE-COLOR HEAT-SENSITIVE RECORDING MATERIAL RICOH CO LTD 1988-12-14 JP disclosed
US-4780511-A Method for making polymeric photoactive aryl iodonium salts, products obtained therefrom, and use GENERAL ELECTRIC COMPANY (US) 1988-10-25 US disclosed
JP-S5859207-A PRODUCTION OF NOVEL HIGH-MOLECULAR COMPOUND AGENCY OF IND SCIENCE & TECHNOL 1983-04-08 JP disclosed
JP-S55145712-A NOVEL HIGH-MOLECULAR COMPOUND HAVING PHASE TRANSFER CATALYTIC EFFECT AND PREPARATION THEREOF AGENCY OF IND SCIENCE & TECHNOL 1980-11-13 JP disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3933509-A Photo-polymerizable composition containing an acid salt of an indolinobenzospiropyran FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12545784-B2 Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device ASIC1, ASIC3, TET3 KCNA3 1222/4885THRB 2387/4885ALDH1A1 3308/4885
US-12461444-B2 Sulfonium salt, photoacid generator, curable composition, and resist composition TIPRL, SPIN1, SPIN2B KCNA3 2890/4885THRB 4373/4885ALDH1A1 2594/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.