⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14164177 | 0.65 | DYRK1A (0.49) | — | |
| SCHEMBL10534630 | 0.65 | — | — | |
| SCHEMBL308340 | 0.65 | — | — | |
| SCHEMBL31547606 | 0.64 | — | — | |
| SCHEMBL2791561 | 0.64 | — | — | |
| Hydrochloric Acid SCHEMBL9313820 | 0.62 | LMNA (0.41) | — | |
| SCHEMBL7039375 | 0.61 | — | — | |
| SCHEMBL29511211 | 0.61 | — | — | |
| SCHEMBL13291152 | 0.61 | GAA (0.38) | — | |
| SCHEMBL3361203 | 0.60 | NOTUM (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0397474-B1 | Photosensitive composition | TOSHIBA KK (JP) | 1997-12-10 | — | — | EP | claimed |
| EP-0397474-A2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-14 | — | — | EP | claimed |
| EP-0397474-B1 | Photosensitive composition | TOSHIBA KK (JP) | 1997-12-10 | — | — | EP | disclosed |
| US-5100768-A | Photoresists for integrated circuits, polyvinyl phenol and nitrogen containing heterocycle | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-03-31 | — | — | US | disclosed |
| EP-0397474-A2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-14 | — | — | EP | disclosed |