SCHEMBL882385

SCHEMBL882385

CC(C#N)C1CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL29487599 0.97
SCHEMBL2759860 0.89 TSHR (0.32)
SCHEMBL1371349 0.88
SCHEMBL937062 0.88
SCHEMBL11704037 0.87 TSHR (0.30)
SCHEMBL8522382 0.86 SHBG (0.39)
SCHEMBL28773707 0.85 JAK2 (0.32)
Methylamine SCHEMBL27951566 0.84 EPHX1 (0.32)
SCHEMBL18126126 0.82 PIK3CD (0.33)
SCHEMBL15295105 0.80 HRH3 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 546 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116102680-B Bottom anti-reflection coating and preparation method and application thereof 上海新阳半导体材料股份有限公司 2024-02-13 CN claimed
CN-117106138-A Silicon hydrogel with high ductility, cornea contact lens and preparation method thereof 上海艾康特医疗科技有限公司 2023-11-24 CN claimed
CN-117067644-A Silicon hydrogel, cornea contact lens and preparation method thereof 上海艾康特医疗科技有限公司 2023-11-17 CN claimed
CN-116102937-B Bottom anti-reflection coating and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-10-20 CN claimed
CN-116102938-B Bottom anti-reflection coating for deep ultraviolet lithography and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-10-20 CN claimed
CN-116102939-B Bottom anti-reflection coating for deep ultraviolet lithography and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-10-03 CN claimed
CN-115873176-B Bottom anti-reflection coating for DUV lithography and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-09-26 CN claimed
CN-115873175-B Bottom anti-reflection coating for DUV lithography and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-09-12 CN claimed
CN-116102680-A Bottom anti-reflection coating and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-05-12 CN claimed
CN-116102938-A Bottom anti-reflection coating for deep ultraviolet lithography and preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-05-12 CN claimed
US-8536204-B2 Amides and thioamides as pesticides BAYER CROPSCIENCE AG (DE) 2013-09-17 US claimed
CN-103254190-A Heteroaryl substituted pyrrolo[2,3-b]pyridines and pyrrolo[2,3-b]pyrimidines as janus kinase inhibitors INCYTE CORP 2013-08-21 CN claimed
CN-103214483-A Heteroaryl substituted pyrrolo[2,3-b]pyridines and pyrrolo[2,3-b]pyrimidines as janus kinase inhibitors INCYTE CORP 2013-07-24 CN claimed
CN-103214484-A Heteroaryl substituted pyrrolo[2,3-b]pyridines and pyrrolo[2,3-b]pyrimidines as janus kinase inhibitors INCYTE CORP A DELAWARE CORP 2013-07-24 CN claimed
WO-2012119984-A1 INDOLECARBOXAMIDES AND BENZIMIDAZOLECARBOXAMIDES AS INSECTICIDES AND ACARICIDES BAYER CROPSCIENCE AG (DE) 2012-09-13 WO claimed
CN-101711271-A Corrosion-preventive adhesive compositions NAT STARCH CHEM INVEST 2010-05-19 CN claimed
CN-101448826-A Heteroaryl substituted pyrrolo [2 ] as janus kinase inhibitors INCYTE CORP (US) 2009-06-03 CN claimed
US-20020016490-A1 Granules of azo-type compounds ATOFINA (FR) 2002-02-07 US claimed
CN-1328541-A Azo-type compound granules ATHOFINA A S (FR) 2001-12-26 CN claimed
US-4288384-A N-Cyanoalkyl haloacetamides herbicidal antidotes STAUFFER CHEMICAL COMPANY (US) 1981-09-08 US claimed