Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 3/20 | 0.60 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.60 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | TP53 | P04637 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | CASP3 | P42574 | 1/20 | 0.54 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.54 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.54 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.54 |
| ▸ | RELA | Q04206 | 1/20 | 0.53 |
| ▸ | FBP1 | P09467 | 1/20 | 0.53 |
| ▸ | MAOA | P21397 | 2/20 | 0.49 |
| ▸ | MAOB | P27338 | 2/20 | 0.49 |
| ▸ | ACHE | P22303 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | MMP1 | P03956 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1795130 | 0.85 | PTGS1 (0.69) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL21847980 | 0.85 | PTGS1 (0.69) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL1795132 | 0.85 | PTGS1 (0.69) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL1179749 | 0.81 | RELA (0.74) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL29862171 | 0.81 | TP53 (0.60) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL23457950 | 0.81 | TP53 (0.60) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL1179750 | 0.81 | RELA (0.74) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL6083570 | 0.81 | — | — | |
| SCHEMBL29673932 | 0.81 | RELA (0.74) | PTGS1PTGS2ALOX5TDP1TP53 | |
| SCHEMBL18087628 | 0.79 | TDP1 (0.53) | PTGS1PTGS2ALOX5TDP1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5698369-A | PHOTODECOMPOSABLE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0417557-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0417556-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| EP-0456075-B1 | Positive-working radiation-sensitive mixture and radiation-sensitive recording material for exposure using deep UV-radiation | HOECHST AG (DE) | 1996-09-11 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| EP-0378067-B1 | Positively working radiation-sensitive mixture containing a multifunctional alpha-diazo-beta-keto ester, process for its preparation and a radiation-sensitive recording material containing this mixture | HOECHST AG (DE) | 1995-05-31 | — | — | EP | disclosed |
| US-5340682-A | Sensitive, heat resistant, noncorrosive | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-23 | — | — | US | disclosed |
| US-5338641-A | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-16 | — | — | US | disclosed |
| US-5256517-A | Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having α-β-keto ester units and sulfonate units | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-10-26 | — | — | US | disclosed |
| US-5198322-A | Positively operating radiation-sensitive mixture containing a polyfunctional α-diazo-β-keto ester and radiation-sensitive recording material containing this mixture | HOECHST AKTIENGESELLSCHAFT (DE) | 1993-03-30 | — | — | US | disclosed |
| EP-0456075-A1 | Positive-working radiation-sensitive mixture and radiation-sensitive recording material for exposure using deep UV-radiation | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-11-13 | — | — | EP | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417557-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |
| EP-0417556-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |
| EP-0378067-A2 | Positively working radiation-sensitive mixture containing a multifunctional alpha-diazo-beta-keto ester, process for its preparation and a radiation-sensitive recording material containing this mixture | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-07-18 | — | — | EP | disclosed |