SCHEMBL8897086

SCHEMBL8897086

CCc1cc(-c2cc(CC)cc(C(C)(C)C)c2O)c(O)c(C(C)(C)C)c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSPA5 P11021 2/20 0.67
ALDH1A1 P00352 8/20 0.50
GAA P10253 4/20 0.50
TSHR P16473 3/20 0.50
LMNA P02545 2/20 0.50
KMT2A Q03164 4/20 0.48
MAPK1 P28482 3/20 0.48
MEN1 O00255 3/20 0.48
HIF1A Q16665 3/20 0.48
CYP1A2 P05177 3/20 0.48
CYP2C9 P11712 3/20 0.48
CYP2C19 P33261 3/20 0.48
CYP3A4 P08684 2/20 0.48
BLM P54132 2/20 0.48
ATM Q13315 2/20 0.48
NPSR1 Q6W5P4 2/20 0.48
TP53 P04637 2/20 0.48
GMNN O75496 1/20 0.48
GABBR2 O75899 1/20 0.48
ALOX15 P16050 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8990192 0.91 HSPA5 (0.57) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL39434 0.89 HSPA5 (0.74) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL8990140 0.87 HSPA5 (0.53) HSPA5ALDH1A1GAATSHRLMNA
Hydrochloric Acid SCHEMBL6039741 0.85 HSPA5 (0.69) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL8380418 0.83 HSPA5 (0.67) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL8990155 0.82 HSPA5 (0.55) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL362006 0.82 HSPA5 (0.65) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL57329 0.82 HSPA5 (0.82) HSPA5ALDH1A1GAATSHRLMNA
Butylated Hydroxytoluene SCHEMBL4397736 0.82 ALDH1A1 (0.72) HSPA5ALDH1A1GAATSHRLMNA
SCHEMBL30467044 0.82 HSPA5 (0.65) HSPA5ALDH1A1GAATSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP claimed
WO-2010042313-A1 SLURRY PROCESS FOR SYNTHESIS OF BISPHOSPHITES DOW TECHNOLOGY INVESTMENTS LLC (US) 2010-04-15 WO disclosed
US-5633418-A CATALYTIC DIMERIZATION OF OLEFIN IN PRESENCE OF ORGANONICKEL, ORGANOALUMINUM AND ORGANOPHOSPHITE COMPOUNDS USED AS CATALYST MITSUBISHI CHEMICAL CORPORATION (JP) 1997-05-27 US disclosed
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP disclosed
US-5262295-A Biphenyldihydroxide reducing agent for silver halide emulsion layers CANON KABUSHIKI KAISHA (JP) 1993-11-16 US disclosed
EP-0509740-A1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KABUSHIKI KAISHA (JP) 1992-10-21 EP disclosed