SCHEMBL8897719

SCHEMBL8897719

O=S(=O)(O[SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2][SiH2]OS(=O)(=O)C(F)(F)F)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA7 P43166 1/20 0.30
CA13 Q8N1Q1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8895821 0.89
SCHEMBL8896926 0.89
SCHEMBL8898496 0.89
SCHEMBL276704 0.86 CA1 (0.35) CA1CA2CA7CA13
SCHEMBL3958177 0.70 CA1 (0.32) CA1CA2CA7CA13
SCHEMBL2904316 0.70 CA1 (0.38) CA1CA2CA7CA13
SCHEMBL2734778 0.70 CA1 (0.32) CA1CA2CA7CA13
SCHEMBL16469194 0.67 F2 (0.30)
SCHEMBL30655904 0.67 F2 (0.30)
SCHEMBL538605 0.67 F2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0622396-B1 Polysilanes and method for producing the same JAPAN RES DEV CORP (JP) 1997-12-03 EP disclosed
US-5663271-A Polysilanes and method for producing the same RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) 1997-09-02 US disclosed
EP-0622396-A2 Polysilanes and method for producing the same Research Development Corporation of Japan (JP) 1994-11-02 EP disclosed