SCHEMBL8907167

SCHEMBL8907167

O=[N+]([O-])c1ccc2ccccc2c1NI

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.55
HPRT1 P00492 1/20 0.51
TSHR P16473 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
CASP6 P55212 1/20 0.44
CTSB P07858 1/20 0.43
MEN1 O00255 5/20 0.43
KMT2A Q03164 5/20 0.43
MAPT P10636 4/20 0.43
KDM4E B2RXH2 2/20 0.43
MAPK1 P28482 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
CYP3A4 P08684 1/20 0.42
HNF4A P41235 2/20 0.41
RXRA P19793 1/20 0.40
NCEH1 Q6PIU2 1/20 0.38
TNF P01375 1/20 0.38
NOD1 Q9Y239 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29094639 0.83 ALDH1A1 (0.55) ALDH1A1HPRT1TSHRTDP1CASP6
SCHEMBL11619937 0.78 ALDH1A1 (0.53) ALDH1A1HPRT1TSHRCASP6CTSB
SCHEMBL28193811 0.77 ALDH1A1 (0.60) ALDH1A1HPRT1TSHRTDP1CASP6
Phosphonic Acid SCHEMBL27295997 0.76 ALDH1A1 (0.47) ALDH1A1HPRT1TSHRTDP1CASP6
SCHEMBL8620590 0.75 ALDH1A1 (0.46) ALDH1A1HPRT1TSHRTDP1CASP6
Hydrochloric Acid SCHEMBL31741333 0.75 MAPT (0.49) ALDH1A1HPRT1TSHRTDP1CASP6
SCHEMBL10958123 0.74 ABCC9 (0.58) ALDH1A1TSHRMEN1KMT2AMAPT
SCHEMBL187452 0.74 TSHR (0.65) ALDH1A1HPRT1TSHRTDP1CASP6
SCHEMBL28727034 0.74 ALDH1A1 (0.47) ALDH1A1HPRT1TSHRTDP1MEN1
SCHEMBL7354454 0.74 MAPT (0.45) ALDH1A1HPRT1TSHRTDP1CASP6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5644038-A PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-07-01 US disclosed
US-5567569-A POSITIVE PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-10-22 US disclosed
EP-0704763-A1 Photoactive compound, preparation thereof and use thereof in resist for x-ray or electron beam lithography International Business Machines Corporation (US) 1996-04-03 EP disclosed